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Conference Proceedings

1. Emerging Device Solutions for the Post-Classical CMOS Era*

De Meyer, K. ; Collaert, N. ; Kubicek, S. ; Kottontharayil, A. ; van Meer, H. ; Verheyen, P.

Pub. info.:	ULSI Process Integration : proceedings of the International Symposium. pp.291-305, 2003. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2003-6

Conference Proceedings

2. P+/N Junction Formation in Thin Strain Relaxed Buffer Strained Silicon Substrates: The Effect of the Junction Anneal

Eneman, G. ; Simoen, E. ; Delhougne, R. ; Verheyen, P. ; Simons, V. ; Loo, R. ; Caymax, M. ; De Meyer, K. ; Vandervorst, W. ; Claeys, C.

Pub. info.:	ULSI Process Integration : proceedings of the International Symposium. pp.338-348, 2005. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-06

Conference Proceedings

3. The Low-Frequency Noise in n-MOSFETs on Strained Silicon: Is There Room for Improvement?

Simoen, E. ; Eneman, G. ; Verheyen, P. ; Delhougne, R. ; Rooyackers, R. ; Loo, R. ; Vandervorst, W. ; De Meyer, K. ; Claeys, C.

Pub. info.:	ULSI Process Integration : proceedings of the International Symposium. pp.349-359, 2005. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-06

Conference Proceedings

4. N+/P and P+/N Junctions in Strained Si on Thin Strain Relaxed SiGe Buffers: the Effect of Defect Density and Layer Structure

Eneman, G. ; Simoen, E. ; Delhougne, R. ; Verheyen, P. ; Ries, M. ; Loo, R. ; Caymax, M. ; Vandervorst, W. ; De Meyer, K.

Pub. info.:	Semiconductor defect engineering - materials, synthetic structures and devices : symposium held March 28-April 1, 2005, San Francisco, California, U.S.A.. pp.119-124, 2005. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	864