1.

Conference Proceedings
Conference Proceedings
1. Improved materials meeting the demands for EUV substrates
Mitra, I. ; Alkemper, J. ; Nolte, U. ; Engel, A. ; Mueller, R. ; Ritter, S. ; Hack, H. ; Megges, K. ; Kohlmann, H. ; Pannhorst, W. ; Davis, M.J. ; Aschke, L. ; Knapp, K.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.219-226,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
2.

Conference Proceedings
Conference Proceedings
2. Thermal expansion behavior of proposed EUVL substrate materials
Mitra, I. ; Davis, M.J. ; Alkemper, J. ; Mueller, R. ; Kohlmann, H. ; Aschke, L. ; Moersen, E. ; Ritter, S. ; Hack, H. ; Pannhorst, W.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.462-468,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
3.

Conference Proceedings
Conference Proceedings
3. Optimized glass-ceramic substrate materials for EUVL applications
Mitra, I. ; Alkemper, J. ; Mueller, R. ; Nolte, U. ; Engel, A. ; Hack, H. ; Kohlmann, H. ; Wittmer, V. ; Pannhorst, W. ; Davis, M.J. ; Aschke, L. ; Knapp, K.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.96-103,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374