Alt- PSM of contact with phase-assist feature for 65-nm node
- Author(s):
You, J.-W. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Shin, J.-J. Chang, C.-H. Kung, L.-W. Chang, B.-C. Dai, C.-M. Gau, T.-S. Lin, B.J. - Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1263
- Page(to):
- 1272
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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