1.

Conference Proceedings
Conference Proceedings
1. THE FORMATION AND REMOVAL OF RESIDUE FORMED DURING TiN FLUOROCARBON PLASMA ETCHING
Kim, Y.B. ; Conard, T. ; Vanhaeren, D. ; Baklanov, M. ; Vanhaelemeersch, S. ; Vandervorst, W. ; Maex, K.
Pub. info.: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.610-616,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-35
2.

Conference Proceedings
Conference Proceedings
2. INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION
Tsai, W. ; Chen, I. ; Carter, R. ; Cartier, E. ; Kluth, J. ; Richard, O. ; Claes, M. ; Lin, Y.M. ; Nohira, H. ; Conard, T. ; Caymax, M. ; Young, E. ; Vandervorst, W. ; DeGendt, S. ; Heyns, M. ; Manabe, Y. ; Maes, J.W. ; Rittersma, Z.M. ; Besling, W. ; Roozeboom, F.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.747-760,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
3.

Conference Proceedings
Conference Proceedings
3. INTEGRATION OF HIGH-k GATE DIELECTRICS - WET ETCH CLEANING AND SURFACE CONDITIONING
De Gendt, S. ; Beckx, S. ; Caymax, M. ; Claes, M. ; Conard, T. ; Delabie, A. ; Deweerd, W. ; Hellin, D. ; Kraus, H. ; Onsia, B. ; Parishev, V. ; Puurunen, R. ; Rohr, E. ; Snow, J. ; Tsai, W. ; Van Doome, P. ; Van Elshocht, S. ; Vertommen, J. ; Witters, T. ; Heyns, M.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.67-77,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
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Conference Proceedings
Conference Proceedings
4. Compatibility of Polysilicon with HfO2-based Gate Dielectrics for CMOS Applications
Kaushik, V. ; De Gendt, S. ; Caymax, M. ; Young, E. ; Rohr, E. ; Van Elshocht, S. ; Delabie, A. ; Claes, M. ; Shi, X. ; Chen, I. ; Carter, R. ; Conard, T. ; Vandervorst, W. ; Schaekers, M. ; Heyns, M.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.391-396,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-6
5.

Conference Proceedings
Conference Proceedings
5. Influence of pre and post process conditions on the composition of thin Si3N4 thin films (3 nm) studied by XPS and TOFSIMS
Conard, T. ; Witte, H. De ; Vandervorst, W. ; Houssa, M. ; Heyns, M. ; Pomarede, C. ; Werkhoven, C.
Pub. info.: Structure and electronic properties of ultrathin dielectric films on silicon and related structures : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A..  pp.69-,  2000.  Warrendale, PA.  MRS-Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 592
6.

Conference Proceedings
Conference Proceedings
6. Physical Characterization of HfO2 Deposited on Ge Substrates by MOCVD
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
Pub. info.: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.287-292,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 809
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Conference Proceedings
Conference Proceedings
7. Physical Characterization of Thin HfO2 Layers by the Combined Analysis with Complementary Techniques
Bender, H. ; Conard, T. ; Richard, O. ; Brijs, B. ; Petry, J. ; Vandervorst, W. ; Defranoux, C. ; Boher, P. ; Rochat, N. ; Wyon, C. ; Mack, P. ; Wolstenholme, J. ; Vitchev, R. ; Houssiau, L. ; Pireaux, J-J. ; Bergmaier, A. ; Dollinger, G.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.223-232,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5133
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Conference Proceedings
Conference Proceedings
8. Growth and Physical Properties of MOCVD-Deposited Hafnium Oxide Films and Their Properties on Silicon
Elshocht, S.Van ; Caymax, M. ; Gendt, S.De ; Conard, T. ; Petry, J. ; Claes, M. ; Witters, T. ; Zhao, C. ; Brijs, B. ; Richard, O. ; Bender, H. ; Vandervorst, W. ; Carter, R. ; Kluth, J. ; Date, L. ; Pique, D. ; Heyns, M.M.
Pub. info.: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.197-202,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 745
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Conference Proceedings
Conference Proceedings
9. High Temperature Stability of High-K Dielectrics: Thermal Processing and Kinetics
Young, E.W.A. ; Chen, J. ; Cosnier, V. ; Lysagh, P. ; Maes, J.W. ; Roozeboom, F. ; Zhao, C. ; Carter, R. ; Richard, O. ; Conard, T.
Pub. info.: Rapid thermal and other short-time processing technologies III : proceedings of the international symposium.  pp.125-136,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-11
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Conference Proceedings
Conference Proceedings
10. On the Nature of Weak Spots in High-k Layers Submitted to Anneals
Petry, J. ; Vandervorst, W. ; Richard, O. ; Conard, T. ; DeWolf, P. ; Kaushik, V. ; Delabie, A. ; Elshocht, S.Van
Pub. info.: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.203-210,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 811
11.

Conference Proceedings
Conference Proceedings
11. Physical Characterization of Thin HfO2 Layers by the Combined Analysis with Complementary Techniques
Bender, H. ; Brijs, B. ; Peby, J. ; Vandervorst, W. ; Defranoux, C. ; Boher, P. ; Rochat, N. ; Wyon, C. ; Mack, P. ; Woistenholme, I. ; Vitchev, R. ; Houssiau, L. ; Pireaux, J.-J. ; Bergmaier, A. ; Dollinger, G. ; Conard, T. ; Richard, O.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.223-232,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-3
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Conference Proceedings
Conference Proceedings
12. High-k Materials for Advanced Gate Stack Dielectrics: A Comparison of ALCVD and MOCVD as Deposition Technologies
Caymax, Matty ; Bender, H. ; Brijs, B. ; Conard, T. ; Gendt, S. De ; Delabie, A. ; Heyns, M. ; Onsia, B. ; Ragnarsson, L. ; Richard, O. ; Vandervorst, W. ; Elshocht, S. Van ; Zhao, C. ; Maes, J. W. ; Date, L. ; Pique, D. ; Young, E. ; Tsai, W. ; Shimamoto, Y.
Pub. info.: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.47-58,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 765
13.

Conference Proceedings
Conference Proceedings
13. INTEGRATION ISSUES OF POLYSILICON WITH HIGH K DIELECTRICS DEPOSITED BY ATOMIC LAYER CHEMICAL VAPOR DEPOSITION
Tsai, W. ; Chen, I. ; Carter, R. ; Cartier, E. ; Kluth, J. ; Richard, O. ; Claes, M. ; Lin, Y.M. ; Nohira, H. ; Conard, T. ; Caymax, M. ; Young, E. ; Vandervorst, W. ; DeGendt, S. ; Heyns, M. ; Manabe, Y. ; Maes, J.W. ; Rittersma, Z.M. ; Besling, W. ; Roozeboom, F.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.747-760,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
14.

Conference Proceedings
Conference Proceedings
14. Scalability of MOCVD-Deposited Hafnium Oxide
Elshocht, S. Van ; Carter, R. ; Caymax, M. ; Claes, M. ; Conard, T. ; Date, L. ; Gendt, S. De ; Kaushik, V. ; Kerber, A. ; Kluth, J. ; Lujan, G. ; Petry, J. ; Pique, D. ; Richard, O. ; Rohr, E. ; Shimamoto, Y. ; Tsai, W. ; Heyns, M. M.
Pub. info.: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.59-64,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 765
15.

Conference Proceedings
Conference Proceedings
15. Studies Of Copper Surfaces Modified By Thermal And Plasma Treatments
Beyer, G.P. ; Baklanov, M. ; Conard, T. ; Maex, K.
Pub. info.: Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A..  pp.D9.17-,  2001.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 612
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Conference Proceedings
Conference Proceedings
16. Physical Characterization of HfO2 Deposited on Ge Substrates by MOCVD
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
Pub. info.: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.163-168,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 811
17.

Conference Proceedings
Conference Proceedings
17. ALD HfO2 Surface Preparation Study
Delabie, Annelies ; Caymax, M. ; Maes, J.W. ; Bajolet, P. ; Brijs, B. ; Cartier, E. ; Conard, T. ; Gendt, S.De ; Richard, O. ; Vandervorst, W. ; Zhao, C. ; Green, M. ; Tsai, W. ; Heyns, M.M.
Pub. info.: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.179-184,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 745
18.

Conference Proceedings
Conference Proceedings
18. Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum UV cleaning
Okoroanyanwu, U. ; Stepanenko, N. ; Vereecke, G. ; Eliat, A. ; Kocsis, M.K. ; Kang, Y.S. ; Jonckheere, R.M. ; Conard, T. ; Ronse, K.G.
Pub. info.: Optical Microlithography XVII.  pp.487-503,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377