Trauwaert, M.-A. ; Vanhellemont, J. ; Simoen, E. ; Claeys, C. ; Johlander, B. ; Harboe-Sorensen, R. ; Adams, L. ; Clauws, P.
Pub. info.:
Beam-solid interactions : fundamentals and applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A.. pp.93-98, 1993. Pittsburgh, Pa.. Materials Research Society
Simoen, E. ; Claeys, C. ; Job, R. ; Ulyashin, A.G. ; Fahrner, W.R. ; Tonelli, G. ; Degryse, O. ; Clauws, P.
Pub. info.:
Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.912-924, 2002. Pennington, NJ. Electrochemical Society
Simoen, E. ; Claeys, C. ; Job, R. ; Ulyashin, A.G. ; Fahrner, W.R. ; Tonelli, G. ; Degryse, O. ; Clauws, P.
Pub. info.:
Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.912-926, 2002. Pennington, NJ. Electrochemical Society
Vanhellemont, J. ; Simoen, E. ; Bosman, G. ; Claeys, C. ; Kaniava, A. ; Gaubas, E. ; Blondeel, A. ; Clauws, P.
Pub. info.:
Proceedings of the Seventh International Symposium on Silicon Materials Science and Technology. pp.670-683, 1994. Pennington, NJ. Electrochemical Society
Rafi, J.M. ; Simoen, E. ; Claeys, C. ; Ulyashin, A. ; Job, R. ; Fahrner, W. ; Versluys, J. ; Clauws, P. ; Lozano, M. ; Campabadal, F.
Pub. info.:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.96-105, 2003. Pennington, NJ. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Simoen, E. ; Huang, Y. L. ; Claeys, C. ; Raft, J. M. ; Job, R. ; Fahrner, W. R. ; Versluys, J. ; Clauws, P.
Pub. info.:
Crystalline defects and contamination: their impact and control in device manufacturing IV : DECON 2005 : proceedings of the Satellite Symposium to ESSDERC 2005, Grenoble, France. pp.165-175, 2005. Pennington, N.J.. Electrochemical Society
Raft, J.M. ; Simoen, E. ; Claeys, C. ; Ulyashin, A. ; Job, R. ; Fahrner, W. ; Versluys, J. ; Clauws, P. ; Lozano, M ; Campabadal, F.
Pub. info.:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.96-105, 2003. Pennington, NJ. Electrochemical Society
Huang, Y.L. ; Simoen, E. ; Job, R. ; Claeys, C. ; Dungen, W. ; Ma, Y. ; Fahrner, W.R. ; Versluys, J. ; Clauws, P.
Pub. info.:
Semiconductor defect engineering - materials, synthetic structures and devices : symposium held March 28-April 1, 2005, San Francisco, California, U.S.A.. pp.307-312, 2005. Warrendale, Pa.. Materials Research Society