1.

Conference Proceedings
Conference Proceedings
1. Evaluation of ArF CLM in the sub-100-nm DRAM cell
Lee, J.-H. ; Chung, D.-H. ; Kim, H.-C. ; Nam, D.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVI.  Part One  pp.251-260,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Extension of Cr-less PSM to sub 90-nm-node DRAM and logic device
Lee, J.-H. ; Kim, H.-D. ; Chung, D.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.727-735,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell
Lee, J.-H. ; Chung, D.-H. ; Cha, D.-C. ; Kim, H.-S. ; Park, J.-S. ; Nam, D.-G. ; Woo, S.-K. ; Cho, H.-S. ; Han, W.-S.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1253-1262,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Application of Cr-less mask technology for sub-100-nm gate with single exposure
Kim, S.-H. ; Chung, D.-H. ; Park, J.S.. ; Shin, I.K. ; Choi, S.W. ; Sohn, J.-M. ; Lee, J.-H. ; Shin, H.-S. ; Chen, J.F. ; Van Den Broeke, D.J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.568-578,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889