Evaluation of EA-PSM opaque repair on 90-nm lithography
- Author(s):
Kim, D.-W. ( Photronics-PKL (South Korea) ) Lee, J.-K. ( Photronics-PKL (South Korea) ) Koo, S.H. ( Photronics-PKL (South Korea) ) Lee, D.-H. ( Photronics-PKL (South Korea) ) Kim, J.-M. ( Photronics-PKL (South Korea) ) Choi, S.-S. ( Photronics-PKL (South Korea) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5130
- Pub. Year:
- 2003
- Page(from):
- 484
- Page(to):
- 495
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- Language:
- English
- Call no.:
- P63600/5130
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Characteristics of residues and optical change of HT PSM during stepwise west cleaning and optimization of HT PSM cleaning process
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Evaluation of the attenuated PSM performance as the shifter transmittance and illumination systems
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Sub 90nm DRAM patterning by using modified chromeless PSM at KrF lithography era
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Modeling and correction of global CD uniformity caused by fogging and loading effects in 90-nm-node CAR process
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Evaluation of lens aberrations depending on the transmittance of DUV-attenuated PSM
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
90-nm-node CD uniformity improvement using a controlled gradient temperature CAR PEB process
SPIE-The International Society for Optical Engineering |