Ganesan, R. ; Choi, J.-H. ; Yun, H.-J. ; Kwon, Y.-G. ; Kim, K.-S. ; Oh, T.-H. ; Kim, J.-B.
Pub. info.:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA. pp.40-51, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering