Real time analysis of the haze environment trapped betsween the pellicle film and the mask surface [6283-07]
- Author(s):
Choi, J. ( Samsung Electronics Co., Ltd (South Korea) ) Lee, S. ( Samsung Advanced Institute of Technology (South Korea) ) Cho, Y. Ji, S. Cha, C. Choi, W. S. Han, S. W. ( Samsung Electronics Co., Ltd (South Korea) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6283
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 62830A
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463586 [0819463582]
- Language:
- English
- Call no.:
- P63600/6283
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Real-time monitoring based on comprehensive analysis of the haze environment under the pellicle film [6349-54]
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Novel mask inspection flow for better defect review and analysis [6283-107]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
3
Conference Proceedings
Substrate effects on the characteristics of haze defect formation on the photomask surface under exposure condition
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Mask fabrication results using new laser writing system: Sigma7300 [6283-14]
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95]
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Study of higher electron beam energy for the mask production for 30 nm node technology [6283-06]
SPIE - The International Society of Optical Engineering |