1.

Conference Proceedings
Conference Proceedings
1. First microprocessors with immersion lithography
Lee, D.-Y. ; Kim, I.-S. ; Jung, S.-G. ; Jung, M.-H. ; Park, J.-O. ; Oh, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.119-128,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Water distribution within immersed polymer films
Kang, Y. ; Hong, J. ; Lee, S.-Y. ; Lee, H.-R. ; Ryoo, M.-H. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.31-39,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
3.

Conference Proceedings
Conference Proceedings
3. Requirement of in-field illumination control for low k1 imaging below 0.3
Hwang, C. ; Shin, J. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1548-1556,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
4.

Conference Proceedings
Conference Proceedings
4. One small step: world's first integrated EUVL process line
Kim, S.-S. ; Chalyck, R. ; Woo, S.-G. ; Cho, H.-K.
Pub. info.: Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA.  pp.64-77,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5751
5.

Conference Proceedings
Conference Proceedings
5. Advanced module-based approach to effective CD prediction of sub-100nm patterns
Shin, J. ; Kim, I. ; Hwang, C. ; Park, D.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA.  pp.65-73,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5378
6.

Conference Proceedings
Conference Proceedings
6. Layer-specific illumination optimization by Monte Carlo method
Kim, H.-C. ; Nam, D.-S. ; Hwang, C. ; Kang, Y.S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVI.  Part One  pp.244-250,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
7.

Conference Proceedings
Conference Proceedings
7. A study of storage life extension for high performance chemically amplified resist coated blanks [5853-03]
Yang, S.-J. ; Seo, S.-M. ; Ko, S.-H. ; Cha, H.-S. ; Kang, G.-W. ; Nam, K.-S. ; Seo. W.-W. ; Jung, W.-K. ; Cho, H.-K. ; Kim, J.-M. ; Choi, S.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.20-30,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
8.

Conference Proceedings
Conference Proceedings
8. Evaluation of ArF CLM in the sub-100-nm DRAM cell
Lee, J.-H. ; Chung, D.-H. ; Kim, H.-C. ; Nam, D.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVI.  Part One  pp.251-260,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
9.

Conference Proceedings
Conference Proceedings
9. Flare-induced CD variation correction using transmittance controlled mask
Nam, D.-S. ; Yeo, G.-S. ; Park, J.R. ; Choi, S.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVI.  Part One  pp.561-569,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
10.

Conference Proceedings
Conference Proceedings
10. Efffectiveness and confirmation of local area flare measurement method in various pattern layouts
Nam, D. ; Lee, E. ; Jung, S.-G. ; Kang, Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Optical Microlithography XV.  Part One  pp.57-66,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
11.

Conference Proceedings
Conference Proceedings
11. ArF issues of 90-nm-node DRAM device integration
Goo, D.-H. ; Kim, B.-S. ; Park, J.-S. ; Yoon, K.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1296-1303,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
12.

Conference Proceedings
Conference Proceedings
12. Challenge for effective OCV control in 90-nm logic gate using ArF lithography
Kang, H.-J. ; Lee, S.-W. ; Lee, D.-Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1194-1201,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
13.

Conference Proceedings
Conference Proceedings
13. Process latitude extension in low k1 DRAM lithography using specific layer-oriented illumination design
Kang, Y.S. ; Nam, D.-S. ; Hwang, C. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1304-1309,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
14.

Conference Proceedings
Conference Proceedings
14. Extension of Cr-less PSM to sub 90-nm-node DRAM and logic device
Lee, J.-H. ; Kim, H.-D. ; Chung, D.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.727-735,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
15.

Conference Proceedings
Conference Proceedings
15. Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world
Kim, I.-S. ; Jung, S.-G. ; Kim, H.-D. ; Yeo, G.-S. ; Shin, I.-K. ; Lee, J.-H. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical Microlithography XV.  Part One  pp.466-475,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
16.

Conference Proceedings
Conference Proceedings
16. Comprehensive approach to determining the specification for mask mean to target
Lee, S.-W. ; Kim, I.S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.209-220,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
17.

Conference Proceedings
Conference Proceedings
17. Assessments on process parameters' influences to the proximity correction
Lee, E.-M. ; Lee, S.-W. ; Lee, D.-Y. ; Choi, S.-H. ; Park, J.-O. ; Jung, S.-G. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.287-295,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
18.

Conference Proceedings
Conference Proceedings
18. Way for LEEPL technology to succeed in memory device application
Kim, I.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.1060-1067,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
19.

Conference Proceedings
Conference Proceedings
19. Successful application of angular scatterometry to process control in sub-100-nm DRAM device
Kim, J.- ; Kim, S.-J. ; Chin, S.-B. ; Oh, S.-H. ; Goo, D.-H. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T. ; Raymond, C.J. ; Littau, M.E. ; Youn, B.J. ; Sohn, C.-J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.541-549,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
20.

Conference Proceedings
Conference Proceedings
20. Image simulation in immersion lithography using Debye integral and scattering matrix method
Kim, S.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.393-404,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
21.

Conference Proceedings
Conference Proceedings
21. Evaluation of puddle time effect and optimization of development process in 193-nm lithography
Lee, H.-R. ; Shin, J. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1115-1122,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
22.

Conference Proceedings
Conference Proceedings
22. Realization of sub-80-nm small-space patterning in ArF photolithography
Kim, S.-H. ; Kim, H.-D. ; Lee, S.-H. ; Park, C.-M. ; Ryoo, M.-H. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1082-1090,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
23.

Conference Proceedings
Conference Proceedings
23. Performance of a SSQ-type ArF bilayer resist in 80-nm node DRAM line and space fabrication
Jung, M.-H. ; Kim, H.-W. ; Hong, J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1100-1106,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
24.

Conference Proceedings
Conference Proceedings
24. Layer-specific illumination for low-k1 periodic and semiperiodic DRAM cell patterns: design procedure and application
Hwang, C. ; Nam, D.-S. ; Park, J.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.947-952,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
25.

Conference Proceedings
Conference Proceedings
25. Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application
Kim, H. ; Nam, D. ; Yeo, G.-S. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.459-462,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
26.

Conference Proceedings
Conference Proceedings
26. Fulfillment of model-based OPC for contact patterns in 60-nm level logic device
Kim, S.-W. ; Lee, S.-W. ; Park, C.-M. ; Choi, S.-H. ; Lee, Y.-M. ; Kang, Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.1157-1164,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
27.

Conference Proceedings
Conference Proceedings
27. Impact of illumination intensity profile on lithography simulation
Hwang, C. ; Kim, I. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.1427-1434,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
28.

Conference Proceedings
Conference Proceedings
28. Modified procedure for evaluation of low-k1 process windows
Park, D.-W. ; Lee, S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.1422-1426,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
29.

Conference Proceedings
Conference Proceedings
29. A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns
Lee, S. ; Hwang, C. ; Park, D.-W. ; Kim, I.-S. ; Kim, H.-C. ; Woo, S.-G. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVII.  pp.1413-1421,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
30.

Conference Proceedings
Conference Proceedings
30. Strategy for sub-80-nm contact hole patterning considering device fabrication
Yoon, J.-Y. ; Hata, M. ; Hah, J.-H. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.196-204,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
31.

Conference Proceedings
Conference Proceedings
31. Comprehensive analysis of sources of total CD variation in ArF resist perspective
Kim, H.-W. ; Lee, H.-R. ; Kim, K.-M. ; Lee, S.Y. ; Kim, B.-C. ; Oh, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.254-265,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
32.

Conference Proceedings
Conference Proceedings
32. Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance
Lee, J.-Y. ; Shin, J. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.426-433,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
33.

Conference Proceedings
Conference Proceedings
33. Simulation of critical dimension and profile metrology based on scatterometry method [6349-57]
Chalykh, R. ; Pundaleva, I. ; Kim, S. ; Cho, H.-K. ; Moon, J.-T.
Pub. info.: Photomask Technology 2006.  pp.63491K-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
34.

Conference Proceedings
Conference Proceedings
34. Improvement of pattern collapse in sub-100 nm nodes
Jung, M.-H. ; Lee, S.-H. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1298-1303,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
35.

Conference Proceedings
Conference Proceedings
35. Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography
Kim, S.-H. ; Lee, S.-H. ; Yeo, G.-S. ; Lee, J.H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.940-947,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
36.

Conference Proceedings
Conference Proceedings
36. What an antishrinkage coating method can surmount among stumbling block of ArF resists
Kim, H.-D. ; Lee, S.-H. ; Choi, S.-J. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.827-837,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
37.

Conference Proceedings
Conference Proceedings
37. Most feasible curing process for ArF resists in device integration aspect
Kim, H.-W. ; Kang, Y. ; Lee, J.-H. ; Chae, Y.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.817-826,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
38.

Conference Proceedings
Conference Proceedings
38. Comparison of ArF bilayer resists for sub-90 nm L/S fabrication
Hong, J. ; Kim, H.-W. ; Lee, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.249-256,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039