RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography
- Author(s):
Hsu,S. ( ASML MaskTools, Inc. ) Shi,X. Hsu,M. Corcoran,N.P. Chen,J.F. Desai,S. Sherrill,M.J. Tseng,Y.C. Chang,H.A. Kao,J.F. Tseng,A. Liu,W.J. Chen,A. Lin,A. Kujten,J.P. Jacobs,E. Verhappen,A. - Publication title:
- Photomask and Next-Generation Lithography Mask Technology VIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4409
- Pub. Year:
- 2001
- Page(from):
- 172
- Page(to):
- 185
- Pages:
- 14
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441119 [0819441112]
- Language:
- English
- Call no.:
- P63600/4409
- Type:
- Conference Proceedings
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