1.

Conference Proceedings
Conference Proceedings
1. STUDY OF THE EFFECT OF SILICON SURFCE TREATMENT ON EOT IN HIGH-k DIELECTRIC MOS GATE STACK
Chang, K. ; Shanmugasundaram, K. ; Lee, D.-O. ; Roman, P. ; Shallenberger, J. ; Chang, F.-M. ; Wang, J. ; Beck, R. ; Mumbauer, P. ; Grant, R. ; Ruzyllo, J.
Pub. info.: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.78-85,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-26
2.

Conference Proceedings
Conference Proceedings
2. Anhydrous HF Processing as an Alternative to HF/Water Processes
Staffa, J. ; Roman, P. ; Chang, K. ; Torek, K. ; Ruzyllo, J.
Pub. info.: Environmental, safety, and health issues in IC production : symposium held December 4-5, 1996, Boston, Massachusetts, U.S.A..  pp.9-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 447
3.

Conference Proceedings
Conference Proceedings
3. 49 Characteristics of Hf(Si,O) Gate Dielectrics as a Function of Hf Content
Chang, K. ; Shallenberger, J. ; Chang, F.-M. ; Shanmugasundaram, K. ; Roman, P. ; Mumbauer, P. ; Ruzyllo, J.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.404-410,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05