1.

Conference Proceedings
Conference Proceedings
1. Improved process control of photomask fabrication in e-beam lithography
Cha,B.-C. ; Park,J.-H. ; Choi,Y.-H. ; Kim,J.-M. ; Han,W.-S. ; Yoon,H.-S. ; Sohn,J.-M.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.508-512,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of the practical use of GHOST technique for various e-beam resists
Cha,B.-C. ; Kim,J.-M. ; Kim,B.-G. ; Choi,S.-W. ; Yoon,H.-S. ; Sohn,J.-M.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.55-62,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546
3.

Conference Proceedings
Conference Proceedings
3. Correction method for radial effect caused by spin process
Kim,J.-M. ; Choi,S.-W. ; Cha,B.-C. ; Yoon,H.-S. ; Sohn,J.-M.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.466-472,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884