1.

Conference Proceedings
Conference Proceedings
1. The Smart-Cut Process: Status and Developments
Aspar, B. ; Lagahe, C. ; Moriceau, H. ; Jalaguier, E. ; Mas, A. ; Rayssac, O. ; Biasse, Soubie; B. ; Bruel, M. ; Auberton-Hevre, A.J. ; Barge, T. ; Letertre, F. ; Maleville, C.
Pub. info.: Semiconductor wafer bonding : science, technology, and applications : proceedings of the international symposia.  pp.48-59,  1999.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-35
2.

Conference Proceedings
Conference Proceedings
2. Unibond SOI wafers achieved by Smart-Cut process
Bruel, M. ; Aspar, B. ; Maleville, C. ; Moriceau, H. ; Auberton-Herve, A.J. ; Barge, T.
Pub. info.: Proceedings of the Eighth International Symposium on Silicon-on-Insulator Technology and Devices.  pp.3-14,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-23
3.

Conference Proceedings
Conference Proceedings
3. Unibond SOI Wafers Achieved by Smart-Cut Process
Bruel, M. ; Aspar, B. ; Maleville, C. ; Moriceau, H. ; Auberton-Herve, A.J. ; Barge, T.
Pub. info.: Proceedings of the Fourth International Symposium on Semiconductor Wafer Bonding : science, technology, and applications.  pp.13-24,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-36
4.

Conference Proceedings
Conference Proceedings
4. Detailed Characterization of Wafer Bonding Mechanisms
Maleville, C. ; Rayssac, O. ; Moriceau, H. ; Blasse, B. ; Baroux, L. ; Aspar, B. ; Bruel, M.
Pub. info.: Proceedings of the Fourth International Symposium on Semiconductor Wafer Bonding : science, technology, and applications.  pp.46-55,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-36
5.

Conference Proceedings
Conference Proceedings
5. *HIGH TEMPERATURE ANNEALING OF SIMOX LAYERS: PHYSICAL MECHANISMS OF OXYGEN SEGREGATION
Jaussaud, C. ; Margail, J. ; Stoemenos, J. ; Bruel, M.
Pub. info.: Silicon-on-insulator and buried metals in semiconductors : symposium held November 30-December 3, 1987, Boston, Massachusetts, U.S.A..  pp.17-28,  1988.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 107
6.

Conference Proceedings
Conference Proceedings
6. 1-3 MeV B+ AND B+ IMPLANTS FOR C-MOS TECHNOLOGY
De Pontcharra, J. ; Spinelli, P. ; Bruel, M.
Pub. info.: Ion beam processes in advanced electronic materials and device technology : symposium held April 15-18, 1985, San Francisco, California, U.S.A..  pp.115-122,  1985.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 45
7.

Conference Proceedings
Conference Proceedings
7. *HIGH TEMPERATURE ANNEALING OF SIMOX LAYERS PHYSICAL MECHANISMS OF OXYGEN SEGREGATION
Jaussaud, C. ; Margail, J. ; Stoemenos, J. ; Bruel, M.
Pub. info.: Fundamentals of beam-solid interactions and transient thermal processing : symposium held November 30-December 3, 1987, Boston, Massachusetts, U.S.A..  pp.17-28,  1988.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 100
8.

Conference Proceedings
Conference Proceedings
8. IMPLANTATION INDUCED FILAMENTARY STRUCTURES
Jaussaud, C. ; Maillot, B. ; Bruel, M.
Pub. info.: Ion implantation and ion beam processing of materials : symposium held November 1983 in Boston, Massachusetts, U.S.A..  pp.223-228,  1984.  New York.  North-Holland
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 27
9.

Conference Proceedings
Conference Proceedings
9. Single-Crystal Semiconductor Layer Delamination and Transfer Through Hydrogen Implantation
Bruel, M. ; Aspar, B. ; Moriceau, H. ; Jalaguier, E. ; Lagahe, C.
Pub. info.: Proceedings of the Third International Symposium on Defects in Silicon.  pp.203-214,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-1
10.

Conference Proceedings
Conference Proceedings
10. INVITED: SILICON ON INSULATOR WAFERS USING THE SMART CUT TECHNOLOGY
Auberton-Herve, A.J. ; Barge, T. ; Metral, F. ; Bruel, M. ; Aspar, B. ; Moriceau, H.
Pub. info.: Silicon materials science and technology : proceedings of the Eighth International Symposium on Silicon Materials Science and Technology.  pp.1341-1360,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-1(2)
11.

Conference Proceedings
Conference Proceedings
11. Smart-Cut Technology: An Industrial Application of Ion-Implantation-Induced Cavities
Aspar, B. ; Lagahe, C. ; Moriceau, H. ; Soubie, A. ; Bruel, M. ; Auberton-Herve, A. J. ; Barge, T. ; Maleville, C.
Pub. info.: Defect and impurity engineered semiconductors, II : symposium held April 13-17, 1998, San Francisco, California, U.S.A..  pp.381-,  1998.  Warrendale, Pa.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 510
12.

Conference Proceedings
Conference Proceedings
12. Smart-Cut(R): The Basic Fabrication Process for Unibond(R) SOI Wafers
Auberton-Herve, A. J. ; Barge, T. ; Metral, F. ; Bruel, M. ; Aspar, B. ; Meleville, C. ; Moriceau, H. ; Poumeyrol, T.
Pub. info.: Amorphous and crystalline insulating thin films--1996 : symposium held December 2-4, 1996, Boston, Massachusetts, U.S.A..  pp.177-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 446
13.

Conference Proceedings
Conference Proceedings
13. New SiC on insulator wafers based on the Smart-Cut approach and their potential applications
Joly, J.P. ; Aspar, B. ; Bruel, M. ; Di Cioccio, L. ; Letertre, F. ; Hugonnard-Bruyere, E.
Pub. info.: Progress in SOI structures and devices operating at extreme conditions.  pp.31-38,  2002.  Dordrecht.  Kluwer Academic Publishers
Title of ser.: NATO science series. Series 2, Mathematics, physics and chemistry
Ser. no.: 58
14.

Conference Proceedings
Conference Proceedings
14. OUTGASSING OF PHOTORESIST DURING ION IMPLANTATION
Roche,. D. ; Michaud, J. F. ; Bruel, M.
Pub. info.: Ion beam processes in advanced electronic materials and device technology : symposium held April 15-18, 1985, San Francisco, California, U.S.A..  pp.203-210,  1985.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 45