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Process control and optimization of conventional metal process for 0.18-ｦﾌm logic technology

Author(s):
Subramanian,R. ( Advanced Micro Devices,Inc. )
Brown,S.E.
Chen,S.H.
Morales,C.
Gallardo,E.
Singh,B.
1 more
Publication title:
Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3998
Pub. Year:
2000
Page(from):
178
Page(to):
186
Pub. info.:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436160 [081943616X]
Language:
English
Call no.:
P63600/3998
Type:
Conference Proceedings

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