1.

Conference Proceedings
Conference Proceedings
1. Real-time on-wafer evaluation of contaminant-induced defects from resist processing
Lowell,J.K. ; Ackmann,P.W. ; Brown,S.E. ; Sherry,J. ; Hossain,T.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.206-216,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
2.

Conference Proceedings
Conference Proceedings
2. Phase shifting and optical proximity corrections to improve CD control on logic devices in manufacturing for sub-0.35-ｦﾌm i-line
Ackmann,P.W. ; Brown,S.E. ; Nistler,J.L. ; Spence,C.A.
Pub. info.: Optical Microlithography X.  pp.146-153,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
3.

Conference Proceedings
Conference Proceedings
3. Use of exposure compensation to improve device performance for speed and binning based on electrical parametric feedback into fabrication design
Ackmann,P.W. ; Brown,S.E. ; Edwards,R. ; Downey,D. ; Michael,M. ; Turnquest,K. ; Nistler,J.L.
Pub. info.: Optical Microlithography X.  pp.384-390,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051