Search records | 東京工業大学附属図書館文献データベース

Sort order

4 results

Conference Proceedings

1. Novel single-layer photoresist containing cycloolefins for 193 nm

Park,J.-H. ; Seo,D.-C. ; Kim,K.-D. ; Park,S.-Y. ; Kim,S.-J. ; Lee,H. ; Jung,J.-C. ; Bok,C.-K. ; Baik,K.-H.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.454-462, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

2. ArF photoresist system using alicyclic polymer

Park,J.-H. ; Kim,S.-J. ; Park,S.-Y. ; Lee,H. ; Jung,J.-C. ; Bok,C.-K. ; Baik,K.-H.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.485-491, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

3. Design of cycloolefin-maleic-anhydride resist for ArF lithography

Jung,J.-C. ; Bok,C.-K. ; Baik,K.-H.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.11-25, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

4. Terpolymer of maleic anhydride and cycloolefin derivatives as an ArF photoresist

Kim,S.-J. ; Park,J.-H. ; Kim,J.-H. ; Kim,K.-D. ; Lee,H. ; Jung,J.-C. ; Bok,C.-K. ; Baik,K.-H.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.430-436, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049