Limitation of optical lithography for various resolution enhancement technologies
- Author(s):
- Eom, T.-S. ( Hynix Semiconductor Inc. (Korea) )
- Ahn, C.-N.
- Park, D.-H.
- Koh, C.-W.
- Bok, C.-K.
- Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1575
- Page(to):
- 1583
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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