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Process Analysis and Modeling of Thin Silicon Film Deposition by Hot-Wire Chemical Vapor Deposition

Author(s):
Publication title:
Fundamental gas-phase and surface chemistry of vapor-phase deposition II and process control, diagnostics, and modeling in semiconductor manufacturing IV : proceedings of the international symposium
Title of ser.:
Electrochemical Society Proceedings Series
Ser. no.:
2001-13
Pub. Year:
2001
Page(from):
260
Page(to):
267
Pages:
8
Pub. info.:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773195 [1566773199]
Language:
English
Call no.:
E23400/200113
Type:
Conference Proceedings

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