1.

Conference Proceedings
Conference Proceedings
1. FORMATION OF WELL-SEPARATED BURIED AND SURFACE NICKEL-SILICIDE LAYERS IN A SINGLE ION IMPLANTATION STEP
Wu, M.F. ; De Wachter, J. ; Hendrickx, P. ; Pattyn, H. ; Van Bavel, A.M. ; Langouche, G. ; Vanhellemont, J. ; Bender, H. ; Maenhoudt, M. ; Bruynseraede, Y.
Pub. info.: Beam-solid interactions : fundamentals and applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.899-904,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 279
2.

Conference Proceedings
Conference Proceedings
2. Experimental Verification of a Random Medium Model for the Optical Behavior of Ultrathin Crystalline Silicon Layers Grown on Porous Silicon
Abouelsaood, A. A. ; Bender, H. ; Caymax, N. ; Ghannam, M. Y. ; Nijs, J. ; Poortmans, J. ; Stalmans, L.
Pub. info.: Amorphous and heterogeneous silicon thin films : fundamentals to devices - 1999 : symposium held April 5-9, 1999, San Francisco, California, U.S.A..  pp.207-212,  1999.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 557
3.

Conference Proceedings
Conference Proceedings
3. WITH WAFERS WITH NITROGEN DOPED SUBSTRATES AND THEIR GETTERING BEHAVIOR
Sebmolke, R. ; Blietz, M. ; Hoelzl, R. ; Menzel, D. ; Bender, H.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.658-669,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
4.

Conference Proceedings
Conference Proceedings
4. HYDROGEN PASSIVATION OF HF-LAST CLEANED (100) SILICON SURFACES: A MIR-FTIR STUDY
Bender, H. ; Verhaverbeke, S. ; Heyns, M.M.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.186-194,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
5.

Conference Proceedings
Conference Proceedings
5. IN SITU AND REAL TIME STUDIES OF WET CHEMICAL SILICON SURFACE CLEANING REACTIONS
Schmidt, H.F. ; Teerlinck, I. ; Storm, W. ; Bender, H. ; Heyns, M.M.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.480-491,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20
6.

Conference Proceedings
Conference Proceedings
6. Electron Microscopic Studies of Co- and Ti-Germanosilicide Films Formed on SiGe Layers
Jin, S. ; Donaton, R. A. ; Bender, H. ; Maex, K.
Pub. info.: Electron microscopy of semiconducting materials and ULSI devices : symposium held Aprl 15-16, 1998, San Francisco, California, U. S. A..  pp.133-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 523
7.

Conference Proceedings
Conference Proceedings
7. Stress in Silicon Due to the Formation of Self Aligned Poly-CoSi2 Lines Studied by Micro-Raman Spectroscopy
Howard, D. J. ; Wolf, I. De ; Bender, H. ; Maex, K.
Pub. info.: Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA.  pp.251-,  1996.  Pittsburgh.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 402
8.

Conference Proceedings
Conference Proceedings
8. Structure and magnetic properties of Fe-N thin films grown by ECR deposition
Nemeth, S. ; Akinaga, H. ; Boeve, H. ; Bender, H. ; Boeck, J. de ; Borghs, G.
Pub. info.: Advanced hard and soft magnetic materials : symposium held April 5-8, 1999, San Francisco, California, U.S.A..  pp.611-,  1999.  Warrendale.  MRS-Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 577
9.

Conference Proceedings
Conference Proceedings
9. ION BEAM SYNTHESIS OF BURIED CoxNi1-xSi2 LAYERS IN SILICON
Wu, M. F. ; Wachter, J. De ; Bavel, A.-M. Van ; Pattyn, H. ; Langouche, G. ; Vanhellemont, J. ; Bender, H. ; Temst, K. ; Wuyts, B. ; Bruynseraede, Y.
Pub. info.: Silicides, germanides, and their interfaces : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A..  pp.159-,  1994.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 320
10.

Conference Proceedings
Conference Proceedings
10. Comparative study of structural properties and photoluminescence in InGaN layers with a high in content
Vantomme, A. ; Wu, M. F. ; Hogg, S. ; Langouche, G. ; Jacobs, K. ; Moerman, I. ; White, M. E. ; O'Donnell, K. P. ; Nistor, L. ; Landuyt, J. Van ; Bender, H.
Pub. info.: GaN and related alloys - 1999 : symposium held November 28-December 3, 1999, Boston, Massachusetts, U.S.A..  pp.W11.38.1-,  2000.  Warrendale, Pa..  MRS-Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 595
11.

Conference Proceedings
Conference Proceedings
11. Microstructural Studies of Co Silicide Layers Formed on SiGe and SiGeC
Jin, S. ; Bender, H. ; Donaton, R. A. ; Maex, K. ; Vantomme, A. ; Langouche, G. ; Amour, A. St. ; Sturm, J. C.
Pub. info.: Structure and evolution of surfaces : symposium held December 2-5, 1996, Boston, Massachusette, U.S.A..  pp.481-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 440
12.

Conference Proceedings
Conference Proceedings
12. Characterization of Ultra-Thin PtSi Films for Infrared Detectors
Bender, H. ; Roussel, P. ; Kolodinski, S. ; Torres, A. ; Donaton, R. A. ; Maex, K. ; Sluis, P. Van der
Pub. info.: Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA.  pp.449-,  1996.  Pittsburgh.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 402
13.

Conference Proceedings
Conference Proceedings
13. Enhancement of the METAL/Si-DOPED AlGaAs schottky barrier height by CH4/H2 reactive ion etching
Pereira, R. ; Hove, M. Van ; Raedt, W. De ; Alay, J. ; Bender, H. ; Vandervorst, W. ; Borghs, G. ; Rossum, M. Van
Pub. info.: III-V electronic and photonic device fabrication and performance : symposium held April 12-15, 1993, San Francisco, California, U.S.A..  pp.211-,  1993.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 300
14.

Conference Proceedings
Conference Proceedings
14. The Influence of Ti Capping Layers on CoSi2 Formation in the Presence of Interfacial Oxide
Detavernier, C. ; Donaton, R. A. ; Maex, K. ; Jin, S. ; Bender, H. ; Meirhaeghe, R. Van ; Cardon, F.
Pub. info.: Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.139-,  1999.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 564
15.

Conference Proceedings
Conference Proceedings
15. Influence of the As and BF2 Junction Implantation on Stress Induced Defects During Ti- and Co/Ti-Silicidation
Steegen, A. ; Bender, H. ; Wolf, I. De ; Maex, K.
Pub. info.: Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.15-,  1999.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 564
16.

Conference Proceedings
Conference Proceedings
16. New Approaches for Formation of Ultra-Thin PtSi Layers for Infrared Applications
Donaton, R. A. ; Jin, S. ; Bender, H. ; Zagrebnov, M. ; Baert, K. ; Maex, K. ; Vantomme, A. ; Langouche, G.
Pub. info.: Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A..  pp.307-,  1998.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 525
17.

Conference Proceedings
Conference Proceedings
17. Formation and Thermal Stability of Nd0.32Y0.68Si1.7 Layers Formed by Channeled Ion Beam Synthesis
Wu, M. F. ; Vantomme, A. ; Hogg, S. ; Pattyn, H. ; Langouche, G. ; Jin, S. ; Bender, H.
Pub. info.: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.191-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 514
18.

Conference Proceedings
Conference Proceedings
18. OPTIMIZATION OF OHMIC CONTACTS ON LATTICE-MATCHED AND PSEUDOMORPHIC AlInAs/InGaAs/InP
Hove, M. Van ; Skrabka, T. ; Bender, H. ; Raedt, W. De ; Rossum, M. Van ; Baeyens, Y.
Pub. info.: Growth, processing, and characterization of semiconductor heterostructures : Symposium held November 29-December 2, 1993, Massachusetts, U.S.A..  pp.463-,  1994.  Pittsburgh.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 326
19.

Conference Proceedings
Conference Proceedings
19. Influence of SiGe Thickness on the Co/SiGe/Si Solid State Reaction
Donaton, R. A. ; Jin, S. ; Bender, H. ; Maex, K. ; Vantomme, A. ; Langouche, G.
Pub. info.: Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.151-,  1999.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 564
20.

Conference Proceedings
Conference Proceedings
20. Structural Characterization of Ion Beam Synthesized Epitaxial ErSi2-x Layers
Bender, H. ; Wu, M. F. ; Vantomme, A. ; Pattyn, H. ; Langouche, G.
Pub. info.: Silicide thin films - fabrication, properties, and applications : Symposium held November 27-30, 1995, Boston, Massachusetts, USA.  pp.499-,  1996.  Pittsburgh.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 402
21.

Conference Proceedings
Conference Proceedings
21. ION BEAM SYNTHESIS OF BURIED CoxNi1-xSi2 LAYERS IN SILICON
Wu, M. F. ; Wachter, J. De ; Bavel, A.-M. Van ; Pattyn, H. ; Langouche, G. ; Vanhellemont, J. ; Bender, H. ; Temst, K. ; Wuyts, B. ; Bruynseraede, Y.
Pub. info.: Materials synthesis and processing using ion beams : symposium held November 29-December 3, 1993, Boston, Massachusetts, U.S.A..  pp.711-,  1994.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 316
22.

Conference Proceedings
Conference Proceedings
22. Interface Quality and Magnetic Properties of ｦﾓMnAl/Co Superlattices on GaAs
Bruynseraede, C. ; Boeck, J. De ; Roy, W. Van ; Lauhoff, G. ; Bender, H. ; Esch, A. Van ; Mertens, R. ; Bland, J. A. C. ; Borghs, G.
Pub. info.: Magnetic ultrathin films, multilayers and surfaces : symposium held April 17-20, 1995, San Francisco, California, U.S.A..  pp.85-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 384
23.

Conference Proceedings
Conference Proceedings
23. Recent Developments in Nuclear Methods in Support of Semiconductor Characterization
Brijs, B. ; Bender, H. ; Huyghebaert, C. ; Janssens, T. ; Vandervorst, W. ; Nakajima, K. ; Kimura, K. ; Bergmaier, A. ; Dollinger, G. ; van den Berg, J.A.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.50-62,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5133
24.

Conference Proceedings
Conference Proceedings
24. The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration
Kaushik, V. S. ; DeGendt, S. ; Carter, R. ; Claes, M. ; Rohr, E. ; Pantisano, L. ; Kluth, J. ; Kerber, A. ; Cosnier, V. ; Cartier, E. ; Tsai, W. ; Young, E. ; Green, M. ; Chen, J. ; Jang, S-A. ; Lin, S. ; Delabie, A. ; Elshocht, S. V. ; Manabe, Y. ; Richard, O. ; Zhao, C. ; Bender, H. ; Caymax, M. ; Heyns, M.
Pub. info.: Crystalline oxide-silicon heterostructures and oxide optoelectronics : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.145-152,  2003.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 747
25.

Conference Proceedings
Conference Proceedings
25. Focused Ion Beam Analysis of Cu/Low-k Metallization Structures
Bender, H.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.357-372,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5133
26.

Conference Proceedings
Conference Proceedings
26. Spectroscopic Ellipsometry in the VUV Range Applied to the Characterization of Atomic Layer Deposited HfO2, Al2O3 and HfAIO x Thin Layers for High K Dielectrics
Boher, P. ; Defranoux, C. ; Bourtauld, S. ; Piel, J.P. ; Bender, H.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.305-315,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5133
27.

Conference Proceedings
Conference Proceedings
27. Physical Characterization of Thin HfO2 Layers by the Combined Analysis with Complementary Techniques
Bender, H. ; Conard, T. ; Richard, O. ; Brijs, B. ; Petry, J. ; Vandervorst, W. ; Defranoux, C. ; Boher, P. ; Rochat, N. ; Wyon, C. ; Mack, P. ; Wolstenholme, J. ; Vitchev, R. ; Houssiau, L. ; Pireaux, J-J. ; Bergmaier, A. ; Dollinger, G.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.223-232,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5133
28.

Conference Proceedings
Conference Proceedings
28. The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration
Kaushik, V.S. ; Gendt, S.De ; Carter, R. ; Claes, M. ; Rohr, E. ; Pantisano, L. ; Kluth, J. ; Kerber, A. ; Cosnier, V. ; Cartier, E. ; Tsai, W. ; Young, E. ; Green, M. ; Chen, J. ; Jang, S-A. ; Lin, S. ; Delabie, A. ; Elshocht, S.V. ; Manabe, Y. ; Richard, O. ; Zhao, C. ; Bender, H. ; Caymax, M. ; Heyns, M.
Pub. info.: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.335-342,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 745
29.

Conference Proceedings
Conference Proceedings
29. Structure and Magnetic Properties of Fe-N Thin Films Grown by ECR Deposition
Akinaga, H. ; Bender, H. ; Boeve, H. ; Borghs, G. ; DeBoeck, J. ; Nemeth, S.
Pub. info.: Polycrystalline metal and magnetic thin films : symposium held April 5-8, 1999, San Francisco, California, U.S.A..  pp.295-300,  1999.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 562
30.

Conference Proceedings
Conference Proceedings
30. Spectroscopic Ellipsometry in the VUV Range Applied to the Characterization of Atomic Layer Deposited HfO2, A1203 and HfAIOx Thin Layers for High k Dielectrics
Boher, P. ; Defranoux, C. ; Bourtauld, S. ; Piel, J.P. ; Bender, H.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.305-315,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-3
31.

Conference Proceedings
Conference Proceedings
31. Focused Ion Beam Analysis of Cu/Low-k Metallization Structures
Bender, H.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.357-372,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-3
32.

Conference Proceedings
Conference Proceedings
32. Physcial Characterization of Ultrathin High-k Dielectrics
Vandervorst, W. ; Brijs, B. ; Bender, H. ; Conard, O.T. ; Petry, J. ; Richard, O. ; Elshocht, S.Van ; Delabie, A. ; Caymax, M. ; Gendt, S.De
Pub. info.: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.23-34,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 745
33.

Conference Proceedings
Conference Proceedings
33. Thermal Stability of High-k Layers
Zhao, C. ; Cosnier, V. ; Chen, P.J. ; Richard, O. ; Roebben, G. ; Maes, J. ; Elshocht, S.Van ; Bender, H. ; Young, E. ; Biest, O.Van Der ; Caymax, M. ; Vandervorst, W. ; Gendt, S.De ; Heyns, M.
Pub. info.: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.9-14,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 745
34.

Conference Proceedings
Conference Proceedings
34. Growth and Physical Properties of MOCVD-Deposited Hafnium Oxide Films and Their Properties on Silicon
Elshocht, S.Van ; Caymax, M. ; Gendt, S.De ; Conard, T. ; Petry, J. ; Claes, M. ; Witters, T. ; Zhao, C. ; Brijs, B. ; Richard, O. ; Bender, H. ; Vandervorst, W. ; Carter, R. ; Kluth, J. ; Date, L. ; Pique, D. ; Heyns, M.M.
Pub. info.: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.197-202,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 745
35.

Conference Proceedings
Conference Proceedings
35. Characterization of High-k Dielectrics by Combined Spectroscopic Ellipsometry (SE) and X-Ray Reflectometry (XRR)
Sun, L. ; Defranoux, C. ; Stehle, J. L. ; Boher, P. ; Evrard, P. ; Bellandi, E. ; Bender, H.
Pub. info.: Fundamentals of novel oxide/semiconductor interfaces : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A..  pp.95-102,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 786
36.

Conference Proceedings
Conference Proceedings
36. Physical Characterization of Thin HfO2 Layers by the Combined Analysis with Complementary Techniques
Bender, H. ; Brijs, B. ; Peby, J. ; Vandervorst, W. ; Defranoux, C. ; Boher, P. ; Rochat, N. ; Wyon, C. ; Mack, P. ; Woistenholme, I. ; Vitchev, R. ; Houssiau, L. ; Pireaux, J.-J. ; Bergmaier, A. ; Dollinger, G. ; Conard, T. ; Richard, O.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.223-232,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-3
37.

Conference Proceedings
Conference Proceedings
37. Recent Developments in Nuclear Methods in Support of Semiconductor Characterization
Brijs, B. ; Bender, H. ; Huyghebaert, C. ; Janssens, T. ; Vandervorsi, W. ; Nakajima, K. ; Kimura, K. ; Bergmaier, A. ; Dollinger, G. ; van den Berg, J.A.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.50-62,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-3
38.

Conference Proceedings
Conference Proceedings
38. A Quantitative Study Of The Adhesion Between Copper, Barrier And Organic Low-k Materials
Lanckmans, F. ; Brongersma, S. ; Varga, I. ; Bender, H. ; Beyne, E. ; Maex, K.
Pub. info.: Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A..  pp.D1.4-,  2001.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 612
39.

Conference Proceedings
Conference Proceedings
39. BULK MICRO DEFECTS OF P/P- EPITAXIAL SILICON WITH WAFERS WITH NITROGEN DOPED SUBSTRATES AND THEIR GETTERING BEHAVIOR
Schmolke, R. ; Blietz, M. ; Hoelzl, R. ; Menzel, D. ; Bender, H.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.658-669,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
40.

Conference Proceedings
Conference Proceedings
40. High-k Materials for Advanced Gate Stack Dielectrics: A Comparison of ALCVD and MOCVD as Deposition Technologies
Caymax, Matty ; Bender, H. ; Brijs, B. ; Conard, T. ; Gendt, S. De ; Delabie, A. ; Heyns, M. ; Onsia, B. ; Ragnarsson, L. ; Richard, O. ; Vandervorst, W. ; Elshocht, S. Van ; Zhao, C. ; Maes, J. W. ; Date, L. ; Pique, D. ; Young, E. ; Tsai, W. ; Shimamoto, Y.
Pub. info.: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.47-58,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 765
41.

Conference Proceedings
Conference Proceedings
41. HF-LAST CLEANINGS: A STUDY OF THE PROPERTIES WITH RESPECT TO THE DIFFERENT VARIABLES
Verhaverbeke, S. ; Bender, H. ; Meuris, M. ; Mertens, P. W. ; Schmidt, H. F. ; Heyns, M. M.
Pub. info.: Surface chemical cleaning and passivation for semiconductor processing.  pp.457-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 315
42.

Conference Proceedings
Conference Proceedings
42. High Quality GdSi1.7 Layers Formed by High Dose Channeled Implantation
Wu, M. F. ; Vantomme, A. ; Pattyn, H. ; Langouche, G. ; Bender, H.
Pub. info.: Advanced metallization for future ULSI : symposium held April 8-11, 1996, San Francisco, California, U.S.A..  pp.535-,  1996.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 427
43.

Conference Proceedings
Conference Proceedings
43. A Fast and Precise Specimen Preparation Technique for TEM Investigation of Prespecified Areas of Semiconductor Devices
Romano, A. ; Vanhellemont, J. ; Bender, H.
Pub. info.: Specimen preparation for transmission electron microscopy of materials--II : symposium held April 19-20, 1990, San Francisco, California, U.S.A..  pp.167-176,  1990.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 199
44.

Conference Proceedings
Conference Proceedings
44. Power scale-up of the extreme-ultraviolet electric capillary discharge source
Fornaciari, N.R. ; Bender, H. ; Buchenauer, D. ; Dimkoff, J.L. ; Kanouff, M.P. ; Karim, S. ; Romeo, C. ; Shimkaveg, G.M. ; Silfvast, W.T. ; Stewart, K.D.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.110-121,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688