Mask inspection challenges for 90- and 130-nm device technology nodes: inspection sensitivity and printability study using SEMI standard programmed defect masks
- Author(s):
Kim, W.D. ( Texas Instruments Inc. (USA) ) Akima, S. ( Toppan Printing Co., Ltd. (Japan) ) Aquino, C.M. ( KLA-Tencor Corp. (USA) ) Becker, C. Eickhotf, M.D. Narita, T. ( Toppan Printing Co., Ltd. (Japan) ) Quah, S.-K. ( Texas Instruments Inc. (USA) ) Rohr, P.M. Schlaffer, R. ( KLA-Tencor Corp. (USA) ) Tanzawa, J. ( Toppan Printing Co., Ltd. (Japan) ) Yamada, Y. - Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 972
- Page(to):
- 983
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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