1.

Conference Proceedings
Conference Proceedings
1. Scattering and coherence in EUVL
Milster,T.D. ; Beaudry,N.A.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.537-543,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
2.

Conference Proceedings
Conference Proceedings
2. Effects of mask roughness and condenser scattering in EUVL systems
Beaudry,N.A. ; Milster,T.D.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.653-662,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
3.

Conference Proceedings
Conference Proceedings
3. Application of the aberration ring test (ARTEMIS) to determine lens quality and predict its lithographic performance
Moers,M.H. ; Laan,H.van der ; Zellenrath,M. ; Boeij,W.de ; Beaudry,N.A. ; Cummings,K.D. ; Zwol,A.van ; Becht,A. ; Willekers,R.
Pub. info.: Optical Microlithography XIV.  4346  pp.1379-1387,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346