Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA. pp.361-368, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Driessen, F.A. ; Zawadzki, M.T. ; Krishnan, P.R. ; Balasinski, A. ; Vandenberghe, G.
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Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA. pp.224-234, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA. pp.235-240, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA. pp.85-92, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.443-452, 2000. Pennington, N.J.. Electrochemical Society
Photomask and Next-Generation Lithography Mask Technology XII. pp.651-658, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Balasinski, A. ; Moore, A. ; Shamma, N. ; Lin, T. ; Yang, H.
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25th Annual BACUS Symposium on Photomask Technology. pp.599230-599230, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Balasinski, A. ; Iandolo, W. ; Ray, O. ; Karklin, L. ; Axelrad, V.
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Photomask and Next-Generation Lithography Mask Technology IX. pp.606-613, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering