Across-wafer CD uniformity control through lithography and etch process: experimental verification

Across-wafer CD uniformity control through lithography and etch process: experimental verification

Author(s):

Q. Zhang ( Univ. of California, Berkeley (USA) )

C. Tang ( Spansion Inc. (USA) )

J. Cain ( Advanced Micro Devices, Inc. (USA) )

A. Hui ( Spansion, Inc. (USA) )

T. Hsieh ( Spansion, Inc. (USA) )

N. Maccrae ( Spansion, Inc. (USA) )

B. Singh ( Advanced Micro Devices, Inc. (USA) )

K. Poolla ( Univ. of California, Berkeley (USA) )

C. J. Spanos ( Univ. of California, Berkeley (USA) )

4 more

Publication title:

Metrology, inspection, and process control for microlithography XXI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6518

Pub. Year:

2007

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819466372 [0819466379]

Language:

English

Call no.:

P63600/6518

Type:

Conference Proceedings

Details

TDL ID:	ZA00046825
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
Conf. info. (Number):	2007 : 21st
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2007.02.26-2007.03.01

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