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Wafer-scale modeling of pattern effect in oxide chemical mechanical polishing

Author(s):
Ouma,D. ( Massachusetts Institute of Technology )
Stine,B. ( Massachusetts Institute of Technology )
Divecha,R. ( Massachusetts Institute of Technology )
Boning,D. ( Massachusetts Institute of Technology )
Chung,J. ( Massachusetts Institute of Technology )
Shinn,G.B. ( Texas Instruments Inc. )
Ali,I. ( Texas Instruments Inc. )
Clark,J. ( Texas Instruments Inc. )
3 more
Publication title:
Microelectronic Device Technology : 1-2 October 1997, Austin, Texas
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3212
Pub. Year:
1997
Page(from):
236
Page(to):
247
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819426444 [081942644X]
Language:
English
Call no.:
P63600/3212
Type:
Conference Proceedings

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