1.

Conference Proceedings

Conference Proceedings
A. Lauwers ; J. Kittl ; K. Maex
Pub. info.: Rapid thermal processing and beyond : applications in semiconductor processing : special topic volume : selected papers from RTP specialists all over the world, Dornstadt, Germany.  pp.341-354,  2008.  Aedermannsdorf, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 573-574
2.

Conference Proceedings

Conference Proceedings
K. Xu ; A. Lauwers ; R. Vos ; L. Archer ; H. Kraus
Pub. info.: Cleaning and surface conditioning technology in semiconductor device manufacturing 10.  pp.327-334,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(2)
3.

Conference Proceedings

Conference Proceedings
K. Kraus ; V. Fano Leston ; J. Snow ; K. Xu ; M. de Potter de ten Broeck ; A. Lauwers ; P. W. Mertens ; F. Kovacs
Pub. info.: Cleaning Technology in Semiconductor Device Manufacturing IX.  pp.67-74,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(3)
4.

Conference Proceedings

Conference Proceedings
M. Niwa ; R. Mitsuhashi ; S. Hayashi ; K. Yamamoto ; Y. Harada ; M. Kubota ; A. Rothchild ; T. Hoffmann ; S. Kubicek ; S. DeGendt ; M. Heyns ; A. Lauwers ; S. Biesemans ; J. Kittle
Pub. info.: Physics and technology of high-k gate dielectrics III.  pp.269-286,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(5)
5.

Conference Proceedings

Conference Proceedings
J. A. Kitti ; A. Lauwers ; M. van Dal ; H. Yu ; A. Veloso ; T. Hoffinann ; M. Pawlak ; C. Demeurisse ; S. Kubicek ; M. Niwa ; C. Vrancken ; P. Absil ; S. Bieseinans
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment.  pp.233-246,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(2)
6.

Conference Proceedings

Conference Proceedings
S. Mertens ; Y. Cho ; F. Nouri ; R. Schreutelkamp ; Y. Kim ; P. Verheyen ; J. Steenbergen ; C. Vrancken ; H. Bender ; O. Richard ; B. Van Daele ; W. Vandervorst ; P. Absil ; S. Kubicek ; C. Demeurisse ; Z. Tokei ; A. Lauwers ; L. Geenen
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment.  pp.139-148,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 3(2)