1.

Conference Proceedings
Conference Proceedings
1. Post Salicidation Clean: Selective Removal of Un-Reacted NiPt Towards NiPtSi(Ge)
K. Xu ; A. Lauwers ; R. Vos ; L. Archer ; H. Kraus
Pub. info.: Cleaning and surface conditioning technology in semiconductor device manufacturing 10.  pp.327-334,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(2)
2.

Conference Proceedings
Conference Proceedings
2. SELECTIVE REMOVAL OF Ni FOR SALICIDATION AND FULLY SILICIDED GATES
K. Kraus ; V. Fano Leston ; J. Snow ; K. Xu ; M. de Potter de ten Broeck ; A. Lauwers ; P. W. Mertens ; F. Kovacs
Pub. info.: Cleaning Technology in Semiconductor Device Manufacturing IX.  pp.67-74,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(3)