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29 results

Conference Proceedings

1. Top-surface imaging and optical proximity correction:a way to 0.18-ｦﾌm lithography at 248 nm

Goethals,A.M. ; Vertommen,J. ; Roey,F.Van ; Yen,A. ; Tritchkov,A. ; Ronse,K. ; Jonckheere,R. ; hove,L.Van den

Pub. info.:	Optical Microlithography IX. Part1 pp.362-374, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

Conference Proceedings

2. (Sub-) 100-nm gate patterning using 248-nm alternating PSM

Vandenberghe,G.N. ; Jaenen,P. ; Jonckheere,R.M. ; Ronse,K. ; Toublan,O.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. 4409 pp.61-69, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

Conference Proceedings

3. Front-end-of-line process development using 193-nm lithography

Pollentier,I.K. ; Ercken,M. ; Eliat,A. ; Delvaux,C. ; Jaenen,P. ; Ronse,K.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. 4404 pp.56-67, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

4. Lithography aspects of dual-damascene interconnect technology

Maenhoudt,M. ; Goidsenhoven,D.Van ; Pollentier,I.K. ; Ronse,K. ; Lepage,M. ; Struyf,H. ; Hove,M.Van

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. 4404 pp.1-13, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

5. CD control for two-dimensional features in future technology nodes

Verhaegen,S. ; Gordon,R.L. ; Jonckheere,R.M. ; McCallum,M. ; Ronse,K.

Pub. info.:	Optical Microlithography XIV. 4346 pp.368-378, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

6. Performance optimization of the double-exposure slternating PSM for (sub-) 100-nm ICs

Vandenberghe,G.N. ; Driessen,F. ; Adrichem,P.J.van ; Ronse,K. ; Li,J. ; Karklin,L.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.394-405, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

Conference Proceedings

7. Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM

Kim,Y.-C. ; Vandenberghe,G.N. ; Verhaegen,S. ; Ronse,K.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.954-967, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

Conference Proceedings

8. Reticle quality needs for advanced 193-nm lithography

Jonckheere,R.M. ; Vandenberghe,G.N. ; Wiaux,V. ; Verhaegen,S. ; Ronse,K.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. 4409 pp.108-117, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

Conference Proceedings

9. Characterization and optimization of CD control for 0.25-ｦﾌm CMOS applications

Ronse,K. ; Beeck,M.Opde ; Yen,A. ; Kim,K.-H. ; hove,L.Van den

Pub. info.:	Optical Microlithography IX. Part2 pp.555-563, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

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Conference Proceedings

10. Optical proximity effects and correction strategies for chemical-amplified DUV resists

Beeck,M.Op de ; Bruggeman,B. ; Botermans,H. ; Driessche,V.Van ; Yen,A. ; Tritchkov,A. ; Jonckheere,R. ; Ronse,K. ; hove,L.Van den

Pub. info.:	Optical Microlithography IX. Part2 pp.622-633, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

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