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17 results

Conference Proceedings

1. Novel single-layer chemically amplified resist for 193-nm lithography

Choi,S.-J. ; Kang,Y. ; Jung,D.-W. ; Park,C.-G. ; Moon,J.-T.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.104-112, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

2. Design and synthesis of new photoresist materials for ArF lithography

Choi,S.-J. ; Kim,H.-W. ; Woo,S.-G. ; Moon,J.-T.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.54-61, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

3. Design and properties of new deep-UV positive photoresist

Choi,S.-J. ; Jung,S.-Y. ; Kim,C.-H. ; Park,C.-G. ; Han,W.-S. ; Koh,Y.-B. ; Lee,M.-Y.

Pub. info.:	Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.323-331, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2724

Conference Proceedings

4. Three-dimensional subband/wavelet coding of video with motion compensation

Choi,S.-J. ; Woods,J.W.

Pub. info.:	Visual communications and image processing '97 : 12-14 February 1997, San Jose, California. Part1 pp.96-104, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3024

Conference Proceedings

5. Novel polymers for 193-nm single-layer resist based on cycloolefin polymers

Kim,H.-W. ; Lee,S.-H. ; Kwon,K.-Y. ; Jung,D.-W. ; Lee,S. ; Yoon,K.-S. ; Choi,S.-J. ; Woo,S.-G. ; Moon,J.-T.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part2 pp.1100-1107, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

6. Novel resst material for sub-100-nm contact hole pattern

Chung,J.-H. ; Choi,S.-J. ; Kang,Y. ; Woo,S.-G. ; Moon,J.-T.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.305-312, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

7. Novel 193-nm photoresist based on Olefin-containing lactones

Yoon,K.-S. ; Jung,D.-W. ; Lee,S. ; Lee,S.-H. ; Choi,S.-J. ; Woo,S.-G. ; Moon,J.-T.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.688-694, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

8. ArF lithography options for 100-nm technologies

Vandenberghe,G.N. ; Kim,Y.-C. ; Delvaux,C. ; Lucas,K.D. ; Choi,S.-J. ; Ercken,M. ; Ronse,K. ; Vleeming,B.

Pub. info.:	Optical Microlithography XIV. 4346 pp.179-190, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

9. Design and performance of photoresist materials for ArF lithography

Kim,H.-W. ; Jung,D.-W. ; Lee,S. ; Choi,S.-J. ; Woo,S.-G. ; Kavanagh,R.J. ; Barclay,G.G. ; Blacksmith,R.F. ; Kang,D. ; Pohlers,G. ; Cameron,J.F. ; Mattia,J. ; Caporale,S. ; Penniman,T. ; Joesten,L.A. ; Thackeray,J.W.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.776-783, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

10.

Conference Proceedings

10. Development of resists for thermal flow process applicable to mass production

Kang,Y. ; Woo,S.-G. ; Choi,S.-J. ; Moon,J.-T.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.222-231, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

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