Huang, Y. ; Tseng, E. ; Lin, B. S.-M ; Yu, C. C. ; Wang, C.-W. ; Liu, H.-Y.
Pub. info.:
Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA. pp.61560W-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Properties of II-VI semiconductors : bulk crystals, epitaxial films, quantum well structures, and dilute magnetic systems : symposium held November 27-December 2, 1989, Boston, Massachusetts, U.S.A.. pp.39-44, 1990. Pittsburgh, Pa.. Materials Research Society
Impurities, defects, and diffusion in semiconductors : bulk and layered structures : symposium held November 27-December 1, 1989, Boston, Massachusetts, U.S.A.. pp.1031-1036, 1990. Pittsburgh, Pa.. Materials Research Society
Photomask and Next-Generation Lithography Mask Technology X. pp.778-786, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1217-1226, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering