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10 results

1.

Conference Proceedings

1. Dry etching technology of Cr and MoSi layers using high-density plasma source

Kwon,H.-J. ; Oh,K.-S. ; Chang,B.-S. ; Choi,B.-Y. ; Park,K.-H. ; Jeong,S.-H.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.532-539, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

2.

Conference Proceedings

2. Dry etching of Cr layer and its loading effect

Kwon,H.-J. ; Min,D.-S. ; Jang,P.-J. ; Chang,B.-S. ; Choi,B.-Y. ; Park,K.-H. ; Jeong,S.-H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.382-389, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

3.

Conference Proceedings

3. Defects analysis of mask blanks

Lee,D.H. ; Kim,D.W. ; Lee,J.K. ; Jeong,W.G. ; Choi,S.-S. ; Jung,S.-M. ; Jeong,S.-H.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.571-576, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

4.

Conference Proceedings

4. Dry etching characteristics of attenuated phase-shifting masks using Cl2/CF4/O2/He plasmas

Choi,S.J. ; Cha,H.-S. ; Yoon,S.-Y. ; Jung,S.-M. ; Choi,S.-S. ; Jeong,S.-H.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.561-570, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

5.

Conference Proceedings

5. Application of MICP source for next-generation photomask process

Kwon,H.-J. ; Chang,B.-S. ; Choi,B.-Y. ; Park,K.-H. ; Jeong,S.-H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.218-225, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

6.

Conference Proceedings

6. ArF halftone PSM cleaning process optimization for next-generation lithography

Son,Y.-S. ; Jeong,S.-H. ; Kim,J.-B. ; Kim,H.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.416-423, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

7.

Conference Proceedings

7. Loading effect parameters of dry etcher system and their analysis in mask-to-mask loading and within-mask loading

Kwon,H.-J. ; Min,D.-S. ; Jang,P.-J. ; Chang,B.-S. ; Choi,B.-Y. ; Jeong,S.-H.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.79-87, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

8.

Conference Proceedings

8. Evaluation of reticle cleaning performance with different drying methods for high-grade photomasks

Jeong,W.G. ; Lee,S.W. ; Kim,D.H. ; Yoon,Y.J. ; Lee,D.H. ; Choi,B.Y. ; Choi,S.-S. ; Jung,S.M. ; Jeong,S.-H.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.99-110, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

9.

Conference Proceedings

9. Evaluation of various alternating phase shifting mask processes for KrF lithography

Yoon,S.-Y. ; Cha,H.-S. ; Choi,S.-J. ; Jung,S.-M. ; Choi,S.-S. ; Jeong,S.-H.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.1017-1025, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

10.

Conference Proceedings

10. Optimization of alternating phase shifting mask structure

Cha,H.-S. ; Choi,S.-J. ; Yoon,S.-Y. ; Jung,S.-M. ; Choi,S.-S. ; Jeong,S.-H.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.1008-1016, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

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