1.

Conference Proceedings
Conference Proceedings
1. Dry etching of Cr layer and its loading effect
Kwon,H.-J. ; Min,D.-S. ; Jang,P.-J. ; Chang,B.-S. ; Choi,B.-Y. ; Park,K.-H. ; Jeong,S.-H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.382-389,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
2.

Conference Proceedings
Conference Proceedings
2. Application of MICP source for next-generation photomask process
Kwon,H.-J. ; Chang,B.-S. ; Choi,B.-Y. ; Park,K.-H. ; Jeong,S.-H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.218-225,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
3.

Conference Proceedings
Conference Proceedings
3. Dry etching technology of Cr and MoSi layers using high-density plasma source
Kwon,H.-J. ; Oh,K.-S. ; Chang,B.-S. ; Choi,B.-Y. ; Park,K.-H. ; Jeong,S.-H.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.532-539,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
4.

Conference Proceedings
Conference Proceedings
4. Formation of submicrometer current-blocking layer for high-power GaAs/AlGaAs quantum wire array laser
Kim,T.-G. ; Hwang,S.-M. ; Kim,S.-I. ; Son,C.-S. ; Kim,E.K. ; Min,S.-K. ; Park,J.-H. ; Park,K.-H.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.63-67,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723