1.

Conference Proceedings

Conference Proceedings
Chen, T. ; Van Den Broeke, D. ; Park, S. ; Liebchen, A. ; Chen, J. F. ; Hsu, S. ; Park, J. C. ; Yu, L. ; Gronlund, K.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.434-444,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
2.

Conference Proceedings

Conference Proceedings
Chen, J. F. ; Broeke, D. van den ; Hsu, S. ; Hsu, M. C.W. ; Laidig, T. ; Shi, X. ; Chen, T. ; Socha, R. J. ; Hollerbach, U. ; Wampler, K. E. ; Park, J. ; Park, S. ; Gronlund, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.168-179,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
3.

Conference Proceedings

Conference Proceedings
Chen, T. ; Van Den Broeke, D. ; Hsu, S. ; Park, S. ; Berger, G. ; Coskun, T. ; de Vocht, J. ; Chen, F. ; Socha, R. ; Park, J. ; Gronlund, K.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599239-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
4.

Conference Proceedings

Conference Proceedings
Chen, T. ; Van Den Broeke, D. ; Tejnil, E. ; Hsu, S. ; Park, S. ; Berger, G. ; Coskun, T. ; De Vocht, J. ; Corcoran, N. ; Chen, F. J. ; van der Heijden, E. ; Finders, J. ; Engelen, A. ; Socha, R.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831A-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
5.

Conference Proceedings

Conference Proceedings
Chen, T. ; Park, S. ; Berger, G. ; Coskun, T. H. ; de Vocht, J. ; Chen, F. ; Yu, L. ; Hsu, S. ; van den Broeke, D. ; Socha, R. ; Park, J. ; Gronlund, K. ; Davis, T. ; Plachecki, V. ; Harris, T. ; Hansen, S. ; Lambson, C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.785-799,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853