1.

Conference Proceedings
Conference Proceedings
1. Contact potential difference methods for full wafer characterization of Si/Si02 interface defects induced by plasma processing (Invited Paper)
Edelman,P. ; Savchouk,A. ; Wilson,M. ; Jastrzebski,L. ; Lagowski,J.J. ; Nauka,K. ; Ma,S. ; Hoff,A.M. ; DeBusk,D.K.
Pub. info.: In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II :23-24 September 1998 Santa Clara, California.  pp.126-136,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3509
2.

Conference Proceedings
Conference Proceedings
2. Real-time preparation-free imaging of mobile charge in SiO2
Jastrzebski,L. ; Edelman,P. ; Lagowski,J.J. ; Hoff,A.M. ; Savchouk,A. ; Persson,E.
Pub. info.: Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing III.  pp.207-217,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2877