1.

Conference Proceedings
Conference Proceedings
1. Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node
Driessen, F.A. ; van Adrichem, P. ; Philipsen, V. ; Jonckheere, R. ; Liu, H.-Y. ; Karklin, L.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1180-1189,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. Extending ArF to the 65-nm node with full-phase lithography
Driessen, F.A. ; Pierrat, C. ; Vandenberghe, G. ; Ronse, K.G. ; Adrichem, P. ; Liu, H.-Y.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1091-1102,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040