1.

Conference Proceedings
Conference Proceedings
1. Etch, reticle, and track CD fingerprint corrections with local dose compensation
van der Laan, H. ; Carpaij, R. ; Krist, J. ; Noordman, O. ; van Dommelen, Y. ; van Schoot, J. ; Blok, F. ; van Os, C. ; Stegeman, S. ; Hoogenboom, T. ; Hickman, C. ; Byers, E. ; Gugel, T.
Pub. info.: Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA.  pp.107-118,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5755
2.

Conference Proceedings
Conference Proceedings
2. Spot sensor enanled reticle uniformity measurements for 65 nm CDU analysis with scatterometry [6281-18]
Janssen, M. ; van Ingen Schenau, K. ; van der Laan, H.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810F-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281