CD uniformity improvement by active scanner corrections
- Author(s):
van Schoot, J.B. ( ASML (Netherlands) ) Noordman, O. Vanoppen, P. Blok, F. Yim, D. ( Hynix Semiconductor Inc. (Korea) ) Park, C.-H. Cho, B.-H. Theeuwes, T. ( ASML (Korea) ) Min, Y.-H. - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 304
- Page(to):
- 314
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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