1.

Conference Proceedings
Conference Proceedings
1. Process results using automatic pitch decomposition and double patterning technology (DPT) at k1eff <0.20 [6349-36]
Huckabay, J. ; Staud, W. ; Naber, R. ; van Oosten, A. ; Nikolski, P. ; Hsu, S. ; Socha, R. J. ; Dusa, M. V. ; Flagello, D.
Pub. info.: Photomask Technology 2006.  pp.634910-634911,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
2.

Conference Proceedings
Conference Proceedings
2. Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75]
Park, J. ; Hsu, S. ; Van Den Broeke, D. ; Chen, J. F. ; Dusa, M. ; Socha, R. ; Finders, J. ; Vleeming, B. ; van Oosten, A. ; Nikolsky, P. ; Wiaux, V. ; Hendrickx, E. ; Bekaert, J. ; Vandenberghe, G.
Pub. info.: Photomask Technology 2006.  pp.634922-634922,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349