1.

Conference Proceedings
Conference Proceedings
1. Spot sensor enanled reticle uniformity measurements for 65 nm CDU analysis with scatterometry [6281-18]
Janssen, M. ; van Ingen Schenau, K. ; van der Laan, H.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810F-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
2.

Conference Proceedings
Conference Proceedings
2. System qualification and optimization for imaging performance on the 0.80-NA 248-nm step-and-scan systems
van Ingen Schenau, K. ; Bakker, H. ; Zellenrath, M. ; Moerman, R. ; Linders, J. ; Rohe, T. ; Emer, W.
Pub. info.: Optical Microlithography XV.  Part One  pp.637-651,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691