Mask error enhancement-factor (MEEF) metrology using automated scripts in CATS
- Author(s):
- van Adrichem, P.J.M. ( Numerical Technologies, Inc. (Netherlands) )
- Driessen, F.A.J.M.
- van Hasselt, K. ( Philips Semiconductors (Netherlands) )
- Brueck, H.-J. ( MueTec GmbH (Germany) )
- Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 551
- Page(to):
- 557
- Pages:
- 7
- Pub. info.:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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