1.

Conference Proceedings
Conference Proceedings
1. A practical alternating PSM modeling and OPC approach to deal with 3D mask effects for the 65nm node and beyond [5992-66]
Drapeau, M. ; van Adrichem, P. J. M. ; van Look, L. ; Kasprowicz, B. S.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921T-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
2.

Conference Proceedings
Conference Proceedings
2. An efficient resolution enhancement technique flow for 65nm logic poly layer [5853-96]
van Adrichem, P. J. M. ; Chacko, M. ; Kasprowicz, B. S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.109-113,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
3.

Conference Proceedings
Conference Proceedings
3. Reducing alternating phase shift mask (Alt-PSM) write-time through mask data optimization [5853-40]
Kasprowicz, B. S. ; van Adrichem, P. J. M. ; Chacko, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.583-588,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
4.

Conference Proceedings
Conference Proceedings
4. 65nm mask CD qualification on critical features through simulation based lithography verification [5853-132]
van Adrichem, P. J. M. ; Valadez, J. ; Ziger, D. ; Gerold, D.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.380-386,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
5.

Conference Proceedings
Conference Proceedings
5. The interaction of mask manufacturability and alt PSM design parameters
Kasprowicz, B. S. ; van Adrichem, P. J. M.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.63-68,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835