1.

Conference Proceedings
Conference Proceedings
1. Novel chemical shrinkage material for small contact hole and small space patterning
Whittaker, A. K. ; Blakey, I. ; Liu, H. ; Hill, D. J. T. ; George, G. A. ; Conley, W. ; Zimmerman, P.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.214-221,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. 0.31k1 ArF lithography for 70-nm DRAM
Chumanov, G. ; Evanoff, D. D. Jr. ; Luzinov, I. ; Klep, V. ; Zdryko, B. ; Conley, W. ; Zimmerman, P.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.230-240,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
3.

Conference Proceedings
Conference Proceedings
3. Long-Range Order in Ultrathin SiO2 Grown on Ordered Si(100)
Hurst, Q. B. ; Herbots, N. ; Shaw, J. M. ; Floyd, M. M. ; Smith, D. J. ; Culbertson, R. J. ; Grams, M. P. ; Bradley, J. D. ; Zimmerman, P. ; Atluri, V.
Pub. info.: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A..  pp.181-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 567
4.

Conference Proceedings
Conference Proceedings
4. 13 High-k Gate Stack Engineering - towards Meeting Low Standby Power and High Performance Targets
De Gendt, S. ; Brunco, D. ; Caymax, M. ; Canard, T. ; Date, L. ; Delabie, A. ; Deweerd, W. ; Groeseneken, G. ; Houssa, M. ; Hyun, S. ; Kaushik, V. ; Kubicek, S. ; Maes, J. ; Pantisano, L. ; Ragnarsson, L. ; Rohr, E. ; Schram, T. ; Shimamoto, Y. ; Sleeckx, E. ; Vandervorst, W. ; Van Elshocht, S. ; Yamamoto, K. ; Witters, T. ; Zhao, C. ; Zimmerman, P. ; Heyns, M. (Invited Paper)
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.109-117,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
5.

Conference Proceedings
Conference Proceedings
5. Dissolution inhibitors for 157-nm microlithography
Conley, W. ; Miller, D.A. ; Chambers, C.R. ; Osborn, B.P. ; Hung, R.J. ; Tran, H.V. ; Trinque, B.C. ; Pinnow, M.J. ; Chiba, T. ; McDonald, S. ; Zimmerman, P. ; Dammel, R.R. ; Romano, A.R. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.69-75,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
6.

Conference Proceedings
Conference Proceedings
6. Advances in resists for 157-nm microlithography
Trinque, B.C. ; Osborn, B.P. ; Chambers, C.R. ; Hsieh, Y.-T. ; Corry, S.B. ; Chiba, T. ; Hung, R.J. ; Tran, H.V. ; Zimmerman, P. ; Miller, D. ; Conley, W. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.58-68,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
7.

Conference Proceedings
Conference Proceedings
7. Highly transparent resist platforms for 157-nm microlithography: an update
Vohra, V.R. ; Douki, K. ; Kwark, Y.-J. ; Liu, X.-Q. ; Ober, C.K. ; Bae, Y.C. ; Conley, W. ; Miller, D. ; Zimmerman, P.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.84-93,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
8.

Conference Proceedings
Conference Proceedings
8. Negative photoresist for 157-nm microlithography: a progress report
Conley, W. ; Trinque, B.C. ; Miller, D.A. ; Zimmerman, P. ; Kudo, T. ; Dammel, R.R. ; Romano, A.R. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.94-100,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
9.

Conference Proceedings
Conference Proceedings
9. 157-nm pellicles for photolithography: mechanistic investigation of the deep-UV photolysis of fluorocarbons
Lee, K. ; Jockusch, S. ; Turro, N.J. ; French, R.H. ; Wheland, R.C. ; Lemon, M.F. ; Braun, A.M. ; Widerschpan, T. ; Zimmerman, P.
Pub. info.: Optical Microlithography XVII.  pp.1598-1605,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
10.

Conference Proceedings
Conference Proceedings
10. Advances in TFE-based fluoropolymers for 157-nm lithography: a progress report
Sharif, I. ; DesMarteau, D. ; Ford, L. ; Shafer, G.J. ; Thomas, B. ; Conley, W. ; Zimmerman, P. ; Miller, D. ; Lee, G.S. ; Chambers, C.R. ; Trinque, B.C. ; Chiba, T. ; Osborn, B.P. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.33-42,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039