1.

Conference Proceedings
Conference Proceedings
1. Printability study with polarization based AIMS fab 193i to investigate mask polarization effects [6281-11]
Zibold, A. ; Stroessner, U. ; Poortinga, E. ; Schmid, R. ; Scherubl, T ; Rosenkranz, N. ; Harnisch, W.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.628108-628108,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
2.

Conference Proceedings
Conference Proceedings
2. Printability study with polarisation capable AIMS fab 193i to study polarisation effects [6152-92]
Zibold, A. ; Stroessner, U. ; Ridley, A. ; Scherubl, T. ; Rosenkranz, N. ; Harnisch, W. ; Poortinga, E. ; Schmid, R. ; Bekaert, J. ; Philipsen, V. ; Van Look, L.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61522F-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
3.

Conference Proceedings
Conference Proceedings
3. Extended process window using variable transmission PSM materials for 65 nm and 45 nm node [6283-120]
Koepernik, C. ; Becker, H. ; Brikner, R. ; Buttgereit, U. ; Irmscher, M. ; Nedelmann, L. ; Zibold, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
4.

Conference Proceedings
Conference Proceedings
4. Image imbalance compensation in alternating phase-shift masks towards the 45-nm node through-pitch imaging [5992-65]
Van Look, L. ; Kasprowicz, B. ; Zibold, A. ; Degel, W. ; Vandenberghe, G.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921S-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
5.

Conference Proceedings
Conference Proceedings
5. Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node [5992-61]
Bekaert, J. ; Philipsen, V. ; Vandenberghe, G. ; van den Broeke, D. ; Degel, W. ; Zibold, A.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921O-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
6.

Conference Proceedings
Conference Proceedings
6. Process window enhancement for 45-nm node using alterable transmission phase-shifting materials [6349-19]
Becker, H. ; Renno, M. ; Hess, G. ; Buttgereit, U. ; Koepernik, C. ; Nedelmann, L. ; Irmscher, M. ; Birkner, R. ; Zibold, A. ; Scheruebl, T.
Pub. info.: Photomask Technology 2006.  pp.63490J-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
7.

Conference Proceedings
Conference Proceedings
7. Improved prediction of across chip linewidth variation (ACLV) with photomask aerial image CD metrology [6349-23]
Poortinga, E. ; Zibold, A. ; Conley, W. ; Litt, L. C. ; Kasprowicz, B. ; Cangemi, M.
Pub. info.: Photomask Technology 2006.  pp.63490N-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
8.

Conference Proceedings
Conference Proceedings
8. EUV mask simulation for AIMS
Windpassinger, R. ; Rosenkranz, N. ; Scherubl, T. ; Evanschitzky, P. ; Erdmann, A. ; Zibold, A.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1249-1258,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
9.

Conference Proceedings
Conference Proceedings
9. First result for hyper NA scanner emulation from AIMS 45-193i [6283-110]
Zibold, A. ; Strossner, U. ; Rosenkraz, N. ; Ridley, A. ; Richter, R. ; Harnisch, W. ; Williams, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.628312-628312,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283