Comparative Studies of TMAH and KOH for Anisotropic Etching of Silicon
- Author(s):
- Zavracky, P.M.
- Publication title:
- Proceedings of the Third International Symposium on Microstructures and Microfabricated Systems
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 97-5
- Pub. Year:
- 1997
- Page(from):
- 102
- Page(to):
- 117
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771320 [1566771323]
- Language:
- English
- Call no.:
- E23400/970514
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Architecture for low-power real-time image analysis using 3D silicon technology
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Wet anisotropic etching by TMAH with NCW-1002 surfactant on crystalline silicon surface
Society of Photo-optical Instrumentation Engineers |
8
Conference Proceedings
COMPARATIVE STUDY OF LIGHT-EMITTING POROUS SILICON ANODIZED WITH LIGHT ASSISTANCE AND IN THE DARK
Materials Research Society |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Electrochemical Etching of Silicon Substrates for Photovoltaic Applications
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
High-etch-rate anisotropic deep silicon plasma etching for the fabrication of microsensors
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
11
Conference Proceedings
Silicon waveguide fabrication process based on the anisotropic etching of Si<111>- oriented wafers
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
High-etch-rate deep anisotropic plasma etching of silicon for MEMS fabrication
SPIE-The International Society for Optical Engineering |