1.

Conference Proceedings
Conference Proceedings
1. Full Optimized Process of Polysilicon TFT's Using Very Large Excimer Laser
Helen, Y. ; Gautier, G. ; Mourgues, K. ; Mohammed-Brahim, T. ; Raoult, F. ; Bonnaud, O. ; Prat, C. ; Zahorski, D. ; Lemoine, D.
Pub. info.: Thin Film Transistor Technologies V : proceedings of the International Symposium.  pp.103-110,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-31
2.

Conference Proceedings
Conference Proceedings
2. Experiment and Modelization Results on Laser Thermal Processing for Ultra-Shallow Junction Formation: Influence of Laser Pulse Duration
Venturini, J. ; Hernandez, M. ; Zahorski, D. ; Kerrien, G. ; Sarnet, T. ; Debarre, D. ; Boulmer, J. ; Laviron, C. ; Semeria, M. -N. ; Camel, D. ; Santailler, J. -L.
Pub. info.: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.255-260,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 765
3.

Conference Proceedings
Conference Proceedings
3. Single-Shot Excimer Laser Annealing and In Process Ellipsometry Analysis for Ultra Shallow Junctions
Noguchi, T. ; Kerrien, G. ; Sarnet, T . ; Debarre, D. ; Boulmer, J. ; Zahorski, D. ; Hernandez, M. ; Defranoux, C. ; Laviron, C. ; Semeria, M.-N.
Pub. info.: Silicon front-end junction formation technologies : symposium held April 2-4, 2002, San Francisco, California, U.S.A..  pp.33-38,  2002.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 717
4.

Conference Proceedings
Conference Proceedings
4. Spectroscopic polarized scatterometry applied to single-line profiling [6152-116]
Stehle, J. L. ; Piel, J. P ; Campillo, J. ; Zahorski, D. ; Giovannini, H.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61522Z-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
5.

Conference Proceedings
Conference Proceedings
5. Infrared spectroscopic ellipsometry in semiconductor manufacturing
Guittet, P.-Y. ; Mantz, U. ; Weidner, P. ; Stehle, J.-L. ; Bucchia, M. ; Bourtault, S. ; Zahorski, D.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.771-778,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375