1.

Conference Proceedings
Conference Proceedings
1. Approach to pattern aspect ratio control
Thomas,A.C. ; Zach,F.X. ; Wong,A.K. ; Ferguson,R.A. ; Samuels,D.J. ; Longo,R. ; Zhu,J. ; Feild,C.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.839-846,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Subwavelength alignment mark signal analysis of advanced memory products
Yin,X. ; Wong,A.K. ; Wheeler,D.C. ; Williams,G. ; Lehner,E.A. ; Zach,F.X. ; Kim,B.Y. ; Fukuzaki,Y. ; Lu,Z.G. ; Credendino,S. ; Wiltshire,T.J.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.449-459,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
3.

Conference Proceedings
Conference Proceedings
3. Nickel related deep levels in germanium
Zach,F.X. ; Grimmeiss,H. ; Haller,E.E.
Pub. info.: Proceedings of the 16th International Conference on Defects in Semiconductors : Lehigh University, Bethlehem, Pennsylvania, 22-26 July 1991.  Pt.1  pp.245-250,  1992.  Zurich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 83-87
4.

Conference Proceedings
Conference Proceedings
4. Process dependencies of optical proximity corrections
Zach,F.X. ; Samuels,D.J. ; Thomas,A.C. ; Butt,S.A.
Pub. info.: Optical Microlithography XIV.  4346  pp.113-118,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
5.

Conference Proceedings
Conference Proceedings
5. Aberration analysis using reconstructed aerial images of isolated contacts on attenuated phase-shift masks
Zach,F.X. ; Lin,C.Y. ; Kirk,J.P.
Pub. info.: Optical Microlithography XIV.  4346  pp.1362-1368,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
6.

Conference Proceedings
Conference Proceedings
6. Optimization of segmented alignment marks for advanced semidonductor fabrication processes
Wu,Q. ; Lu,Z.G. ; Williams,G. ; Zach,F.X. ; Liegl,B.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.234-244,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344