1.

Conference Proceedings
Conference Proceedings
1. Mission Support Role of a Lunar Rover,
Ichikawa, M. ; Takeshi, S. ; Yoshioka, N. ; Itagaki, H.
Pub. info.: Proceedings of the fourth International Conference on Exploration and Utilisation of the Moon, ICEUM 4, 10-14 July 2000, ESTEC, Noordwijk, the Netherlands.  pp.155-158,  2000.  Noordwijk, The Netherlands.  ESA Publications Division
Title of ser.: ESA SP
Ser. no.: 462
2.

Conference Proceedings
Conference Proceedings
2. Designing of Lunar Rovers for High Work Performance,
Aizawa, J. ; Yoshioka, N. ; Miyata, M. ; Wakabayashi, Y.
Pub. info.: iSAIRAS '99 : Fifth International Symposium on Artificial Intelligence, Robotics and Automation in Space, ESTEC, Noordwijk, the Netherlands, 1-3 June 1999.  pp.63-68,  1999.  Noordwijk, Netherlands.  ESA Publications Division
Title of ser.: ESA SP
Ser. no.: 440
3.

Technical Paper
Technical Paper
3. Effect of Ultra-Thin Liquid Lubricant Films on Dynamics of Nano-Spacing Flying Head Sliders in Hard Disk Drives.
Tagawa, N. ; Yoshioka, N. ; Mori, A.
Pub. info.: A.S.M.E. paper.  2003.  New York, NY.  American Society of Mechanical Engineers
Title of ser.: ASME Technical Paper : TRIB
Ser. no.: 2003
4.

Conference Proceedings
Conference Proceedings
4. The guideline of reticle data management(Ver. 2)
Iriki, N. ; Miyazaki, N. ; Homma, M. ; Sato, T. ; Onodera, T. ; Matsuda, T. ; Uga, T. ; Higashino, H. ; Higashikawa, I. ; Yoshioka, N.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.60-69,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
5.

Conference Proceedings
Conference Proceedings
5. Unified mask data formats for EB writers
Kuriyama, K. ; Suzuki, T. ; Hirumi, J. ; Yoshioka, N. ; Hojo, Y. ; Kawase, Y. ; Hara, S. ; Hoga, M. ; Watanabe, S.W. ; Inoue, M. ; Kawase, H. ; Kamimoto, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.660-671,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
6.

Conference Proceedings
Conference Proceedings
6. GDS2NEO: high-compression data processing system for a new EB handling format
Kawase, H. ; Kamimoto, T. ; Ogasawara, H. ; Kuriyama, K. ; Hirumi, J. ; Yoshioka, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.638-647,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
7.

Conference Proceedings
Conference Proceedings
7. The novel approach for optical proximity correction using genetic algorithms [5992-176]
Matsunawa, T. ; Nosato, H. ; Sakanashi, H. ; Murakawa, M. ; Murata, N. ; Terasawa, T. ; Tanaka, T. ; Yoshioka, N. ; Suga, O. ; Higuchi, T.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599254-599254,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
8.

Conference Proceedings
Conference Proceedings
8. Requirements for mask technology from the view point of SOC and FLASH memory trends (Invited Paper) [5853-01]
Imai, A. ; Yoshioka, N. ; Hanawa, T. ; Narimatsu, ’K. ; Hosono, K. ; Suko, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.1-9,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
9.

Conference Proceedings
Conference Proceedings
9. Selete activity of 157-nm lithography and masks
Yoshioka, N. ; Itani, T. ; Wakamiya, W.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.220-224,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148
10.

Conference Proceedings
Conference Proceedings
10. Advanced FIB mask repair technology for 100-nm/ArF lithography: II
Hagiwara, R. ; Yasaka, A. ; Aita, K. ; Takaoka, O. ; Koyama, Y. ; Kozakai, T. ; Doi, T. ; Muramatsu, M. ; Suzuki, K. ; Sugiyama, Y. ; Matsuda, O. ; Okabe, M. ; Shinohara, S. ; Hasuda, M. ; Adachi, T. ; Morikawa, Y. ; Nishiguchi, M. ; Sato, Y. ; Hayashi, N. ; Ozawa, T. ; Tanaka, Y. ; Yoshioka, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.510-519,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130