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13 results

Conference Proceedings

1. *ELECTRON-BEAM RECRYSTALLIZATION OF SILICON LAYERS ON SILICON DIOXIDE

Inoue, T. ; Shibata, K. ; Kato, K. ; Yoshii, T. ; Higashinakagawa, I. ; Taniguchi, K. ; Kashiwagi, M.

Pub. info.:	Energy beam-solid interactions and transient thermal processing : symposium held November 1983 in Boston, Massachusetts, U.S.A.. pp.523-532, 1984. New York. North-Holland
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	23

Conference Proceedings

2. Structure and properties of fullerene nanowhiskers prepared by the liquid-liquid interfacial precipitation method (Invited Paper)

Miyazawa, K. ; Fujino, M. ; Minato, J. ; Yoshii, T. ; Kizuka, T. ; Suga, T.

Pub. info.:	Smart materials III : 13-15 December 2004, Sydney, Australia. pp.224-234, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5648

Conference Proceedings

3. Advanced image placement performance for the current EPL masks [6151-53]

Eguchi, H. ; Sugimura, H. ; Koike, K. ; Sakaue, H. ; Arimoto, H. ; Ogawa, K. ; Susa, T. ; Kunitani, S. ; Kurosu, T. ; Yoshii, T. ; Itoh, K.

Pub. info.:	Emerging Lithographic Technologies X. pp.61511G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6151

Conference Proceedings

4. Development and performance of the advanced hard x-ray telescope for the balloon experiment [6266-123]

Miyazawa, E. ; Shibata, R. ; Ogasaka, Y. ; Fukaya, Y. ; Naitou, M. ; Iwahara, T. ; Shimoda, K. ; Tamura, K. ; Furuzawa, A. ; Kunieda, H. ; Yamashita, K. ; Yokai, S. ; Yoshii, T. ; Watanabe, N. ; Namba, Y.

Pub. info.:	Space Telescopes and Instrumentation II: Ultraviolet to Gamma Ray. pp.62663C-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6266

Conference Proceedings

5. 200-mm EPL stencil mask fabrication by using SOI substrate

Sugimura, H. ; Eguchi, H. ; Yoshii, T. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.925-933, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

6. Low-stress stencil masks using SOI substrates for EPL and LEEPL

Eguchi, H. ; Kurosu, T. ; Yoshii, T. ; Sugimura, H. ; Itoh, K. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.879-887, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

7. Practical LEEPL masks for sub-65-nm node

Yotsui, K. ; Sumida, T. ; Negishi, Y. ; Yoshii, T. ; Tamura, A.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.1268-1277, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

Conference Proceedings

8. Low-stress stencil masks using a doping method

Eguchi, H. ; Kurosu, T. ; Yoshii, T. ; Sugimura, H. ; Itoh, K. ; Tamura, A.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.871-879, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

9. Evaluation of quartz dry etching profile for the PSM lithography performance [5853-109]

Komizo, T. ; Nemoto, S. ; Kojima, Y. ; Ohshima, T. ; Yoshii, T. ; Konishi, T. ; Chiba, K. ; Kikuchi, Y. ; Otaki, M. ; Okuda, Y.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.223-233, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

10.

Conference Proceedings

10. Stencil pattern accuracy of EPL masks [5853-77]

Sugimura, H. ; Yamazaki, T. ; Susa, T. ; Negishi, Y. ; Yoshii, T. ; Eguchi, H. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.884-891, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

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