Improved characteristics of rainbow defects with novel wafer edge exposure technique
- Author(s):
Shim, K.-C. ( Hynix Semiconductor Inc. (Korea) ) Kim, M.-S. Lee, E.-S. Lee, C.-S. Gil, M.-G. Kim, B.-H. In, J.-S. ( NARAE Technology Inc. (Japan) ) Yoon, T.-B. Kim, J.-S. - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4689
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 919
- Page(to):
- 926
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444356 [0819444359]
- Language:
- English
- Call no.:
- P63600/4689
- Type:
- Conference Proceedings
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