1.

Conference Proceedings
Conference Proceedings
1. Alignment system for ArF excimer-laser-based step-and-scan system
Kim,D.H. ; Kim,J.S. ; Sohn,Y.J. ; Kwon,J.H. ; Lee,K.H. ; Choi,S.-S. ; Chung,H.B. ; Yoo,H.J. ; Kim,B.W.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.958-970,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Design of illumination system for ArF excimer laser step-and-scanner
Lee,K.H. ; Kim,D.H. ; Kim,J.S. ; Choi,S.-S. ; Chung,H.B. ; Yoo,H.J. ; Kim,B.W.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.997-1004,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
3.

Conference Proceedings
Conference Proceedings
3. Optimization of electron-beam lithography for super-low-noise HEMTs
Choi,S.-S. ; Lee,J.-H. ; Yun,H.S. ; Chung,H.B. ; Lee,S.Y. ; Yoo,H.J.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.372-382,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723
4.

Conference Proceedings
Conference Proceedings
4. Damage characterization of SiN x-ray mask membrane caused by electron-beam exposure
Choi,S.-S. ; Jeon,Y.J. ; Kim,J.-S. ; Chung,H.B. ; Lee,S.Y. ; Lee,J.H. ; Yoo,H.J.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.321-331,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723
5.

Conference Proceedings
Conference Proceedings
5. Catadioptric Systems for Sub-Quarter Micron Lithography,
Lee,K.H. ; Chung,H.B. ; Kim,D.H. ; Yoo,H.J.
Pub. info.: Optics for science and new technology : 17th Congress of the International Commission for Optics, August 19-23, 1996, Hotel Riviera(Yusong), Taejon Korea.  Part1  pp.11-12,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2778
6.

Conference Proceedings
Conference Proceedings
6. Fabrication of 0.15 ｦﾌm SOIp-MOSFETs using Synchrotron Radiation X-ray Lithography,
Choi,S.S. ; Jeon,Y.J. ; Lyu,J.-S. ; Yoo,H.J. ; Fabrizio,E.D. ; Grella,L. ; Gentili,M.
Pub. info.: Optics for science and new technology : 17th Congress of the International Commission for Optics, August 19-23, 1996, Hotel Riviera(Yusong), Taejon Korea.  Part1  pp.15-16,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2778
7.

Conference Proceedings
Conference Proceedings
7. Performance analysis of ArF excimer laser lithography optics
Lee,K.H. ; Kim,D.H. ; Kim,J.S. ; Chung,H.B. ; Yoo,H.J.
Pub. info.: Optical Microlithography X.  pp.948-958,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
8.

Conference Proceedings
Conference Proceedings
8. Performance of small-field 193-nm exposure system
Kim,D.H. ; Lee,K.H. ; Kim,J.S. ; Choi,S.S. ; Oh,H.-K. ; Chung,H.B. ; Yoo,H.J.
Pub. info.: Optical Microlithography X.  pp.922-932,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
9.

Conference Proceedings
Conference Proceedings
9. Probe-beam scan-type autofocus system using position-sensing detector for subhalf micrometer lithography tools
Kim,D.H. ; Nam,B.-H. ; Lee,K.H. ; Chung,H.B. ; Yoo,H.J.
Pub. info.: Optical Microlithography IX.  Part2  pp.876-885,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726